Flare distance

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Outline• Introduction• Flare evaluation methods and early results– Donut pattern method• What are donuts ?• Point Spread Function data from 2 resists– LS method• How to determine flare distance ?• Results from 3 resists• How to determine flare magnitude, η ?• Results from 3 resists• Summary2008 International Symposium on Extreme Ultraviolet Lithography 2
Introduction• The cause of EUV flare is mirrorsurface roughness.• Flare specification for the ADT is16%; the actual value is ~12%.• We were successful in our 45nmdevice demonstration using rulebased-OPC derived from mirrorpower spectral density (PSD) data.– Residuals thru pitch were lessthan 5 nm.• Do the following patterns measure“actual” flare ?– Donut patterns• to determine flare distance– LS pattern• traditional e-beam proximity effectcorrectionToday, I I will will show early results of of Donut and and LS LS evaluation method.2008 International Symposium on Extreme Ultraviolet Lithography 3
Page 4 and 5: Outline• Introduction• Flare ev
Page 6 and 7: How to determine Flare PSF from Don
Page 8 and 9: Outline• Introduction• Flare ev
Page 10 and 11: Flare distance (50nm LS w/ 100 µm-
Page 12 and 13: DxHow was = derived ?D501+η1+2ηx
Page 14 and 15: Summary• Early results of 2 uniqu

Flare distance

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