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Nanostructuring Division• Photomasks• M(E)MS• Diffractive Optical Elements• Nano DiesNanostructuring• Powerful E-Beam-Writer• Development und manufacture of state-of-the-art photomasks anddiffractive optical components• Process development, evaluation of new materials and processes• Structuring in nanometers, highly-precise measurements16 IMS Overview 2010© IMS 2009
NanostructuringCenter for nanostructure prototypingE-BEAM WriterVistec SB352WAFER MANUFACTUREHamaTech ModuTrackCMOS InfrastructureSTS PegasusMASK PRODUCTIONHamaTech ASR5000 coaterHamaTech ASP5000 developerPlasmatherm mask etcher GenIII/IVVistec LMS IPRO IIVistec CD-SEM LWM900017 IMS Overview 2010© IMS 2009
Page 3 and 4: HistoryFounded by the state of Bade
Page 5 and 6: IMS Association of SponsorsNetwork
Page 7 and 8: ASICs - Areas of OperationASICsVisi
Page 9 and 10: ASICs - ExamplesGATE FOREST ® ASIC
Page 11 and 12: Si Technology DivisionSi Technology
Page 13 and 14: Si Technology: ExamplesThin flexibl
Page 15: Nanostructuring DivisionNanostructu
Page 19 and 20: Nanostructuring: Partnersresist eva
Page 21 and 22: Vision Division (Image Sensors)•
Page 23 and 24: Vision: ProductsHDRC ® - IMAGE SEN
Page 25: IMS CHIPSRingsensorABBILDAirport Sy

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