Catalog 2010 Technology for Vacuum Systems - Chiron

74
Chemistry pumping units down to 0.1 mbar
Roots pumping unit
RP 12C, RP 15C VARIO, RP 22C VARIO
and RP 35C VARIO
The combination of an oil-free chemistry diaphragm pump with a Roots pump leads to a significant increase in
pumping speed and improves ultimate vacuum by an order of magnitude. VACUUBRAND "RP" Roots pumping units
feature a high specific corrosion resistance. The dry and oil-free compression and their good pumping speed, particularly
in the pressure range between 0.2 and 50 mbar, allow the pumping of large amounts of vapors. VARIO ® Roots
pumping units use automatic, gas-load-dependent adjustment of the speed of the Roots pump. This results in high
performance even at high inlet pressures and prevents overheating of the pump.
RP 35C VARIO
40 m³/h
0.1 mbar
PERFORMANCE FEATURES APPLICATIONS
■
low ultimate vacuum < 0.2 mbar
RP 15C VARIO
15 m³/h
0.2 mbar
very high pumping speed from 12 to 40 m³/h, maxi-
■ mum between 0.2 and 50 mbar
measurably reduced backflow of oil due to oil-free
■ pump chamber of Roots pump
virtually oil-free vacuum compared to rotary vane
■ pumps
■ active pollution control: less pollution of environment,
no regular discharge of contaminated waste oil
Further information at www.vacuubrand.com
Roots pumping units provide an especially high pumping
speed and are therefore used for "large" vacuum applications.
They are the ideal vacuum pump for high-boiling
solvents due to their good ultimate vacuum. Typical applications
are distillations, drying processes, and many other
"oil-free" applications such as load lock systems, electron
microscopes, mass spectrometers, and backing pumps for
turbomolecular pumps and cryo pumps.