Catalog 2010 Technology for Vacuum Systems - Chiron
Catalog 2010 Technology for Vacuum Systems - Chiron
Catalog 2010 Technology for Vacuum Systems - Chiron
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84<br />
Oil-free vacuum <strong>for</strong> non-corrosive gases and vapors<br />
Oil-free vacuum <strong>for</strong> non-chemistry<br />
applications<br />
Diaphragm pumps<br />
■ The VACUUBRAND diaphragm pump line includes pumps with a wide range of flow rate and ultimate vacuum. Singlestage<br />
diaphragm pumps reach as much as 70 mbar (absolute) vacuum. By connecting pump heads in series of two,<br />
three or four stages, we can create pumps with ultimate vacuum reaching 0.3 mbar on some models. Connecting the<br />
heads in parallel produces higher flow rates. VACUUBRAND pumps combine these options to create pumps with the<br />
capabilities you need <strong>for</strong> most applications.<br />
Nomenclature <strong>for</strong> VACUUBRAND pumps is built from the following codes designating specific features or<br />
components:<br />
■<br />
■<br />
■<br />
■<br />
The pumping speed of all pumps is measured according to ISO 21360<br />
M = diaphragm (membrane) pump<br />
E, Z, D, V = number of pump stages from single ("E") to four ("V") stage design<br />
NT = labels the new series of pumps comprising the New <strong>Technology</strong><br />
® VARIO or VARIO-B = speed controlled pump with vacuum controller CVC 3000<br />
■ unique VARIO ® regulation offers the distinctive control advantages and convenience of the CVC 3000 controller<br />
Many vacuum applications in laboratories and industrial operations require electronic vacuum regulation. VACUUBRAND's<br />
pg. 142<br />
precision vacuum regulation by modifying the diaphragm pump speed to the needs of the application<br />
■ unsurpassed diaphragm and valve lifetime by reducing the total number of diaphragm strokes<br />
■ exceptionally quiet, with very low vibration and measurably lower energy consumption<br />
■ VARIO<br />
■<br />
® pumps include patented TURBO·MODE TM with automatic speed adjustment that provides even better<br />
backing when used as a <strong>for</strong>e-pump <strong>for</strong> turbomolecular drag pumps (capable of working with backing pressure<br />
in the mbar range). The result is a cooler running turbo pump with better residual gas properties<br />
Further in<strong>for</strong>mation at www.vacuubrand.com