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Nanostructuring Using 3D Deposition Lith
Fig. 1:
MeRit TM MG electron beam
mask repair system.
Fig. 2:
Schematic diagram of
EBID nanostructuring
technology.
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The structuring of materials down
to nanometers (one millionth of
a millimeter) will be crucial to
the development of technologies
in the 21 st century. Ever smaller
structural sizes are required to
improve the performance of electronic
components. One of the
major issues in nanotechnology is
mass production. Nanostructuring
with lithographic techniques is
needed to implement the fabrication
of large, cost-efficient nanostructures.
As a result, calibration
structures with object distances
of less than 100 nm and EBID
scanning tips with a height of 500
nm and a curvature radius of 7
nm at the tip were produced.
Specially developed software for
electron beam guidance in the
VIDAS image processing software
of H.W.P. Koops’ research team
was outstanding in that the exposure
time for each pixel could
be set individually, thus meeting
a requirement of 3D EBID technology.
3D deposition lithography
was used to carry out “rapid prototyping”
of electronic and optical
elements with sub-micrometer
dimensions for the first time.
Innovation 16, Carl Zeiss AG, 2005