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Fig. 3:
User interface with sample
copying function.
Fig. 4:
Sample copying function:
determination of the
structural geometry to be
repaired, reference sample,
mask defect, repair result.
Figs 5/6:
Photo mask – prepared
for analysis and repair.
Fig. 7:
MeRit TM MG
control console..
48
7
3
Photo mask repair
Computer-controlled gas dosing for
organo-metallic and inorganic gases
and sublimable substances evolved
during the development of the EBID
technology. It allowed the supply of
materials through cannulae onto the
substrate surface in the scanning
electron microscope. This opened up
a multitude of applications for electron
beam-induced reactions, providing
the basis for the development
of photo mask repair as a sound
technology needed by industry – a
technology in which a small number
of structures must be very accurately
processed.
Innovation 16, Carl Zeiss AG, 2005