Tutorial "Ion Implantation and Irradiation" - SPIRIT
Tutorial "Ion Implantation and Irradiation" - SPIRIT
Tutorial "Ion Implantation and Irradiation" - SPIRIT
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TRIDYN - Artificial Add-ons<br />
Local Saturation<br />
e.g., stoichiometric limitation<br />
Feeding excess into vacuum ("reemission")<br />
or to flanks of profile ("diffusion")<br />
Molecular Release<br />
e.g., by local saturation or by bond breaking<br />
Release<br />
R <br />
2<br />
fc<br />
c concentration of<br />
excess or free atoms<br />
Matrix Effects in Sputtering: Simple Model<br />
Sputter yield of a specified component depends<br />
linearly on surface concentration of another<br />
component<br />
Molecular Sputtering: Simple Model<br />
Diatomic "molecular" yield is assumed to be<br />
proportional to product of monomer yields<br />
Y <br />
Institute of <strong>Ion</strong> Beam Physics <strong>and</strong> Materials Research Prof. Wolfhard Möller<br />
Implant Concentration<br />
M<br />
i<br />
f<br />
i<br />
M<br />
, j<br />
c<br />
s,<br />
j<br />
f predefined factor<br />
Y <br />
mol<br />
i,<br />
j<br />
f<br />
f Predefined<br />
Factor<br />
Depth<br />
mol<br />
i,<br />
j<br />
YY<br />
i<br />
j<br />
C max
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