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SS 2005 - Kristallographisches Institut - Albert-Ludwigs-Universität ...

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<strong>Albert</strong>-<strong>Ludwigs</strong>-Universität Freiburg • Hebelstr. 25 • D-79104 Freiburg<br />

<strong>SS</strong> <strong>2005</strong><br />

<strong>Kristallographisches</strong> <strong>Institut</strong><br />

Prof. Dr. Arne Cröll<br />

Mai <strong>2005</strong><br />

Seminar<br />

"Aktuelle Fragen der Kristallzüchtung"<br />

Ort:<br />

Beginn:<br />

SR KI – Nr. 01 015, Hermann-Herder-Str. 5, (1.OG)<br />

jeweils Mittwoch, 12.15 h<br />

11.05.<br />

11.05.<br />

A. Cröll<br />

Study of the oxygen incorporation during growth of large CaF 2 -crystals<br />

A. Molchanov, J. Friedrich, G. Wehrhan and G. Müller - JCG 273, 3-4, 629<br />

O. Aniol<br />

Growth and properties of 40 mm diameter Hg 1-x Cd x Te using the two-stage<br />

Pressurised Bridgman Method<br />

Yue Wang, Quanbao Li, Qinglin Han, Qinghua Ma, Ronbin Ju, Bingwen<br />

Song, Wanqi Jie; Yaohe Zhou and Yuko Inatomi<br />

JCG 273, 1-2, 1<br />

25.05.<br />

E. Keller<br />

Das Bindungsvalenz-Konzept zur Vorhersage und Interpretation von<br />

Atomabständen in Kristallen<br />

25.05.<br />

R. Boger<br />

In situ monitoring of the stress evolution in growing group-III-nitride-layers<br />

A. Krost et al. JCG 275 (<strong>2005</strong>) 209-216<br />

Vorschau V. Babentsov<br />

In situ observation for semiconductor solution growth using a near-infrared<br />

micros Termine microscope<br />

folgen<br />

Y Y. Inatomi et al. JCG 275 (<strong>2005</strong>) 193


Fortsetzung Vorschau: Seminar “Aktuelle Fragen der Kristallzüchtung”<br />

2<br />

Vorschau<br />

Termine<br />

folgen<br />

A. Cröll<br />

The effect of nitrogen on void formation in Czochralski silicon crystals<br />

V. V. Voronkov and R. Falster – JCG 273, 3-4, 412<br />

M. Fiederle<br />

A new growth method for Cdte: a breakthrough towards large areas<br />

B. Pelliciari et al. JCG 275 (<strong>2005</strong>) 99-105<br />

N. Graf<br />

InN layers grown on silicon substrates: effect of substrate temperature and<br />

buffer layers<br />

J. Grandal et al. JCG 275 (<strong>2005</strong>) 373-377<br />

A. Danilewsky<br />

l<br />

Semiconductor Bridgman growth inside inertial flight mode orbiting systems of<br />

low orbital eccentricity and long orbital period<br />

X. Ruiz and M. Ermakov – JCG 273, 3-4, 629<br />

R. Boger<br />

Growth and characterization of single-crystalline gallium nitride using (100)<br />

LiAlO 2 subrates<br />

M. D. Reed, O. M. Kryliouk, M. A. Mastro and T. J. Anderson<br />

JCG 274, 1-2, 14

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