Metrology Tools as Basis for Photo Mask Repair and Mask ...
Metrology Tools as Basis for Photo Mask Repair and Mask ...
Metrology Tools as Basis for Photo Mask Repair and Mask ...
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M<strong>as</strong>k <strong>Metrology</strong>: WLCD – CD <strong>Metrology</strong> b<strong>as</strong>ed<br />
on proven Aerial Image Technology<br />
• WLCD is b<strong>as</strong>ed on proven<br />
Aerial Image Technology<br />
• WLCD me<strong>as</strong>ures under the<br />
same conditions <strong>as</strong> the<br />
scanner<br />
• WLCD captures OPC <strong>and</strong><br />
optical MEEF effects<br />
• Simplifies me<strong>as</strong>urement <strong>for</strong><br />
complex 2D features<br />
• FreeForm Illumination<br />
supports SMO technology<br />
• Applied illumination conditions:<br />
same <strong>as</strong> <strong>for</strong> wafer print<br />
Scanner<br />
0.25x<br />
Illuminator<br />
M<strong>as</strong>k<br />
NA 0.35<br />
NA 1.4<br />
Wafer<br />
Wafer print<br />
Illumination<br />
M<strong>as</strong>k<br />
WLCD<br />
450x<br />
Equivalent image <strong>for</strong>mation <strong>for</strong><br />
Scanner <strong>and</strong> WLCD<br />
Illuminator<br />
M<strong>as</strong>k<br />
NA 0.35<br />
NA ~ 0<br />
CCD Camera<br />
Aerial image<br />
Carl Zeiss SMS GmbH, Klaus Edinger<br />
03/27/2013 11
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