Metrology Tools as Basis for Photo Mask Repair and Mask ...
Metrology Tools as Basis for Photo Mask Repair and Mask ...
Metrology Tools as Basis for Photo Mask Repair and Mask ...
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EUV multilayer defect<br />
Compensational repair simulation<br />
LS pattern with bump<br />
Aerial image<br />
Line<br />
Space<br />
Distorsion<br />
Note: Printability of ML defects is strongly focus dependent<br />
Dose to size<br />
Carl Zeiss SMS GmbH, Klaus Edinger<br />
03/27/2013 26