Metrology Tools as Basis for Photo Mask Repair and Mask ...

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EUV multilayer defect Compensational repair simulation LS pattern with bump Aerial image Line Space Distorsion Dose to size Carl Zeiss SMS GmbH, Klaus Edinger 03/27/2013 20
EUV multilayer defect Compensational repair simulation LS pattern with bump Aerial image Line Space Distorsion Dose to size Carl Zeiss SMS GmbH, Klaus Edinger 03/27/2013 21
Page 1 and 2: FCMN 2013: Metrology Tools for Phot
Page 3 and 4: Carl Zeiss „Perfect Mask Solution
Page 5 and 6: PROVE ® Tool Overview System elect
Page 7 and 8: RegC ® Process Concept ‣ Deforma
Page 9 and 10: RegC ® CDU Neutral - Process Steps
Page 11 and 12: Mask Metrology: WLCD - CD Metrology
Page 13 and 14: Focused electron beam based mask re
Page 15 and 16: State-of-the-art achievements with
Page 17 and 18: AIMS: Process window evaluation Car
Page 19: EUV multilayer defect Cross-section
Page 23 and 24: EUV multilayer defect Compensationa
Page 25 and 26: EUV multilayer defect Compensationa
Page 27 and 28: EUV multilayer defect ML bump: reti
Page 29 and 30: Integrated AFM system - Dual head A
Page 31 and 32: Compensational repair: „Pit defec
Page 33: Carl Zeiss SMS GmbH, Klaus Edinger

Metrology Tools as Basis for Photo Mask Repair and Mask ...

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