Metrology Tools as Basis for Photo Mask Repair and Mask ...
Metrology Tools as Basis for Photo Mask Repair and Mask ...
Metrology Tools as Basis for Photo Mask Repair and Mask ...
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EUV absorber e-beam repair<br />
25 nm real defects<br />
25 nm real defects After e-beam repair<br />
M<strong>as</strong>k SEM NXE: 3100 M<strong>as</strong>k SEM NXE: 3100 Comment<br />
Complex<br />
OK<br />
Half height<br />
OK<br />
Multiline<br />
OK<br />
<strong>Repair</strong> success on real defects validated on NXE:3100 scanner<br />
Carl Zeiss SMS GmbH, Klaus Edinger<br />
03/27/2013 18
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