Metrology Tools as Basis for Photo Mask Repair and Mask ...

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Carl Zeiss „Perfect Mask Solutions“ Design Patterning Metrology Tuning Inspection Repair Verification Cleaning In-die Metrology Perfect image placement, CD & phase measurement Mask Tuning Improve registration, overlay and CD performance Zero Defect Solutions High precision repair and actinic repair verification PROVE ® RegC ® MeRiT ® AIMS WLCD CDC Carl Zeiss SMS GmbH, Klaus Edinger 03/27/2013 12
Focused electron beam based mask repair Real defect Repair shape(s) Computer-assisted shape generation, modification and placement Carl Zeiss SMS GmbH, Klaus Edinger 03/27/2013 13
Page 1 and 2: FCMN 2013: Metrology Tools for Phot
Page 3 and 4: Carl Zeiss „Perfect Mask Solution
Page 5 and 6: PROVE ® Tool Overview System elect
Page 7 and 8: RegC ® Process Concept ‣ Deforma
Page 9 and 10: RegC ® CDU Neutral - Process Steps
Page 11: Mask Metrology: WLCD - CD Metrology
Page 15 and 16: State-of-the-art achievements with
Page 17 and 18: AIMS: Process window evaluation Car
Page 19 and 20: EUV multilayer defect Cross-section
Page 21 and 22: EUV multilayer defect Compensationa
Page 27 and 28: EUV multilayer defect ML bump: reti
Page 29 and 30: Integrated AFM system - Dual head A
Page 31 and 32: Compensational repair: „Pit defec
Page 33: Carl Zeiss SMS GmbH, Klaus Edinger

Metrology Tools as Basis for Photo Mask Repair and Mask ...

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