Listing and specification of processing and ... - ISC Konstanz
Listing and specification of processing and ... - ISC Konstanz
Listing and specification of processing and ... - ISC Konstanz
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<strong>Listing</strong> <strong>and</strong> <strong>specification</strong> <strong>of</strong> <strong>processing</strong> <strong>and</strong> characterisation<br />
equipment at <strong>ISC</strong> <strong>Konstanz</strong> 01.01.2008<br />
apparatus applications properties<br />
- wafer cleaning<br />
- isotexture<br />
- P-glass etch<br />
- edge isolation<br />
- single side isotexture<br />
- single side polishing<br />
- 3 tracks<br />
- format: 80 x 120 mm 2 to 210 x 210 mm 2<br />
- up to 2.5m/s<br />
- temperature control: 3°C-98°C<br />
- 130l fluid storage<br />
- fluid head<br />
inline wet-bench (RENA)<br />
batch wet-bench (RENA)<br />
indus batch wet-bench (RENA)<br />
- wafer cleaning<br />
- isotexture<br />
- KOH + IPA texture<br />
- KOH + KON x texture<br />
- alkaline etching<br />
- industrial cleaning<br />
- piranha cleaning<br />
- drying<br />
- POCl3 diffusion<br />
- BBr3 diffusion<br />
- thermal oxidation<br />
not yet at <strong>ISC</strong> <strong>Konstanz</strong><br />
- format: 50 x 50 mm 2 to 210 x 210 mm 2<br />
- alkaline bath with heating<br />
- HCl bath<br />
- HF bath<br />
- different deionised water cascades for<br />
rinsing<br />
- piranha bath<br />
- oven for drying<br />
- format: 50 x 50 mm 2 to 210 x 210 mm 2<br />
- up to 200 wafers (400 wafers back to back)<br />
diffusion furnace (centrotherm)<br />
- roll-on deposition <strong>of</strong> different<br />
precursors<br />
- format: 100 x 100 mm 2 to 210 x 210 mm 2<br />
- single or double side deposition<br />
doper with roll-on (RENA)<br />
- diffusion from roll-on / spin-on /<br />
screen-printed precursor<br />
- ceramic rolls<br />
- temperature up to 1000°C<br />
in-line diffusion furnace<br />
(Tecn<strong>of</strong>imes)
- PECVD SiN, SiC, SiO<br />
- LPCVD SiN<br />
- sintering tube<br />
- format: 50 x 50 mm 2 to 210 x 210 mm 2<br />
- up to 200 wafers<br />
- sintering <strong>of</strong> contacts under ArH-atmosphere<br />
CVD furnace (centrotherm)<br />
- metallisation <strong>of</strong> front <strong>and</strong> rear - semiautomatic screen printer<br />
- format: 50 x 50 mm 2 to 210 x 210 mm 2<br />
- optical adjustment with four cameras<br />
- printing process in less than 10s<br />
- hot melt printing possible<br />
screen printer (Baccini)<br />
screen printer (Ekra) - metallisation <strong>of</strong> front <strong>and</strong> rear - fully manual screen printer<br />
- format: 50 x 50 mm 2 to 210 x 210 mm 2<br />
- metallisation <strong>of</strong> rear side preferred<br />
- front side metallization for small areas<br />
- drying <strong>of</strong> metallised samples - semi automatic operation<br />
- paternoster drying furnace<br />
- format: 50 x 50 mm 2 to 156 x 156 mm 2<br />
- 4 heating zones<br />
- 250 places<br />
- one drying cycle: ca. 5 minutes<br />
- temperature up to 150°C<br />
dryer (Baccini)<br />
- firing <strong>of</strong> metallised samples - metal belt furnace<br />
- format: 50 x 50 mm 2 to 210 x 210 mm 2<br />
- 7m long<br />
- 6 heating zones<br />
- up to 1000°C<br />
- approx. 1.5 min per process<br />
belt-furnace (centrotherm)<br />
laser (Baccini)<br />
electroless Ag-plating (RENA)<br />
several fume hoods<br />
spinner<br />
not yet at <strong>ISC</strong> <strong>Konstanz</strong><br />
not yet at <strong>ISC</strong> <strong>Konstanz</strong><br />
with or without gas-washer<br />
thin surface coatings<br />
- 12 process gases - N2, H2, O2 (technical <strong>and</strong> purer)<br />
- C3H8<br />
- Ar, N20, SF6<br />
- SiH2Cl2, CH4, SiH4, NH3<br />
process gases<br />
chemicals - >10 different chemicals HCl (32%) (hydrochloric acid)<br />
- HF (50%) (hydr<strong>of</strong>luoric acid)<br />
- H 2 O 2 (30%) (hydrogen peroxide)<br />
- NaOH (pellets) (sodium hydroxide)<br />
- KOH (potassium hydroxide)<br />
- HNO 3 (65%) (nitric acid)<br />
- CH 3 COOH (99.8%) (acetic acid)<br />
- H 2 SO 4 (95-97%) (sulphuric acid)<br />
- Na 2 CO 3 (sodium carbonate)<br />
- H 3 PO 4 (ortho-phosphorus acid)<br />
- 2-propanol (IPA)