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Listing and specification of processing and ... - ISC Konstanz

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<strong>Listing</strong> <strong>and</strong> <strong>specification</strong> <strong>of</strong> <strong>processing</strong> <strong>and</strong> characterisation<br />

equipment at <strong>ISC</strong> <strong>Konstanz</strong> 01.01.2008<br />

apparatus applications properties<br />

- wafer cleaning<br />

- isotexture<br />

- P-glass etch<br />

- edge isolation<br />

- single side isotexture<br />

- single side polishing<br />

- 3 tracks<br />

- format: 80 x 120 mm 2 to 210 x 210 mm 2<br />

- up to 2.5m/s<br />

- temperature control: 3°C-98°C<br />

- 130l fluid storage<br />

- fluid head<br />

inline wet-bench (RENA)<br />

batch wet-bench (RENA)<br />

indus batch wet-bench (RENA)<br />

- wafer cleaning<br />

- isotexture<br />

- KOH + IPA texture<br />

- KOH + KON x texture<br />

- alkaline etching<br />

- industrial cleaning<br />

- piranha cleaning<br />

- drying<br />

- POCl3 diffusion<br />

- BBr3 diffusion<br />

- thermal oxidation<br />

not yet at <strong>ISC</strong> <strong>Konstanz</strong><br />

- format: 50 x 50 mm 2 to 210 x 210 mm 2<br />

- alkaline bath with heating<br />

- HCl bath<br />

- HF bath<br />

- different deionised water cascades for<br />

rinsing<br />

- piranha bath<br />

- oven for drying<br />

- format: 50 x 50 mm 2 to 210 x 210 mm 2<br />

- up to 200 wafers (400 wafers back to back)<br />

diffusion furnace (centrotherm)<br />

- roll-on deposition <strong>of</strong> different<br />

precursors<br />

- format: 100 x 100 mm 2 to 210 x 210 mm 2<br />

- single or double side deposition<br />

doper with roll-on (RENA)<br />

- diffusion from roll-on / spin-on /<br />

screen-printed precursor<br />

- ceramic rolls<br />

- temperature up to 1000°C<br />

in-line diffusion furnace<br />

(Tecn<strong>of</strong>imes)


- PECVD SiN, SiC, SiO<br />

- LPCVD SiN<br />

- sintering tube<br />

- format: 50 x 50 mm 2 to 210 x 210 mm 2<br />

- up to 200 wafers<br />

- sintering <strong>of</strong> contacts under ArH-atmosphere<br />

CVD furnace (centrotherm)<br />

- metallisation <strong>of</strong> front <strong>and</strong> rear - semiautomatic screen printer<br />

- format: 50 x 50 mm 2 to 210 x 210 mm 2<br />

- optical adjustment with four cameras<br />

- printing process in less than 10s<br />

- hot melt printing possible<br />

screen printer (Baccini)<br />

screen printer (Ekra) - metallisation <strong>of</strong> front <strong>and</strong> rear - fully manual screen printer<br />

- format: 50 x 50 mm 2 to 210 x 210 mm 2<br />

- metallisation <strong>of</strong> rear side preferred<br />

- front side metallization for small areas<br />

- drying <strong>of</strong> metallised samples - semi automatic operation<br />

- paternoster drying furnace<br />

- format: 50 x 50 mm 2 to 156 x 156 mm 2<br />

- 4 heating zones<br />

- 250 places<br />

- one drying cycle: ca. 5 minutes<br />

- temperature up to 150°C<br />

dryer (Baccini)<br />

- firing <strong>of</strong> metallised samples - metal belt furnace<br />

- format: 50 x 50 mm 2 to 210 x 210 mm 2<br />

- 7m long<br />

- 6 heating zones<br />

- up to 1000°C<br />

- approx. 1.5 min per process<br />

belt-furnace (centrotherm)<br />

laser (Baccini)<br />

electroless Ag-plating (RENA)<br />

several fume hoods<br />

spinner<br />

not yet at <strong>ISC</strong> <strong>Konstanz</strong><br />

not yet at <strong>ISC</strong> <strong>Konstanz</strong><br />

with or without gas-washer<br />

thin surface coatings<br />

- 12 process gases - N2, H2, O2 (technical <strong>and</strong> purer)<br />

- C3H8<br />

- Ar, N20, SF6<br />

- SiH2Cl2, CH4, SiH4, NH3<br />

process gases<br />

chemicals - >10 different chemicals HCl (32%) (hydrochloric acid)<br />

- HF (50%) (hydr<strong>of</strong>luoric acid)<br />

- H 2 O 2 (30%) (hydrogen peroxide)<br />

- NaOH (pellets) (sodium hydroxide)<br />

- KOH (potassium hydroxide)<br />

- HNO 3 (65%) (nitric acid)<br />

- CH 3 COOH (99.8%) (acetic acid)<br />

- H 2 SO 4 (95-97%) (sulphuric acid)<br />

- Na 2 CO 3 (sodium carbonate)<br />

- H 3 PO 4 (ortho-phosphorus acid)<br />

- 2-propanol (IPA)

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