section 1 - World Intellectual Property Organization

12/2002
5706 PCT Gazette - Section I - Gazette du PCT 21 Mar/mar 2002
EE (Utility model / modèle d’utilité) ESFI
FI (Utility model / modèle d’utilité) GBGD
GE GH GM HR HU ID IL IN IS JP KE KG
KP KR KZ LC LK LR LS LT LU LV MA
MD MG MK MN MW MX MZ NO NZ PH
PL PT RO RU SD SE SG SI SK SK (Utility
model / modèle d’utilité) SLTJTMTRTT
TZ UA UG US UZ VN YU ZA ZW.
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ
UG ZW); EA (AM AZ BY KG KZ MD RU
TJ TM); EP (AT BE CH CY DE DK ES FI
FR GB GR IE IT LU MC NL PT SE TR); OA
(BF BJ CF CG CI CM GA GN GQ GW ML
MR NE SN TD TG).
Published / Publiée :(c)
(51) 7 G03F 7/004
(11) WO 02/23273
(21) PCT/JP01/07826
(13) A2
(22) 10 Sep/sep 2001 (10.09.2001)
(25) en (26) en
(30) 2000-275704 11 Sep/sep 2000
(11.09.2000)
JP
(30) 60/238,046 6 Oct/oct 2000
(06.10.2000)
US
(30) 2000-367131 1 Dec/déc 2000
(01.12.2000)
JP
(30) 60/256,916 21 Dec/déc 2000
(21.12.2000)
US
(30) 2001-088113 26 Mar/mar 2001
(26.03.2001)
JP
(30) 2001-268392 5 Sep/sep 2001
(05.09.2001)
JP
(43) 21 Mar/mar 2002 (21.03.2002)
(54) PHOTOSENSITIVE COMPOSITION,
CURED ARTICLE THEREOF, AND
PRINTED CIRCUIT
THE SAME
BOARD USING
COMPOSITION PHOTOSENSIBLE,
ARTICLE DURCI PREPARE AVEC
CETTE COMPOSITION, ET CARTE DE
CIRCUIT IMPRIME COMPRENANT
CET ARTICLE
(71) SHOWA DENKO K.K. [JP/JP]; 13-9,
Shibadaimon 1-chome, Minato-ku, Tokyo
105-8518 (JP).
(for all designated States except / pour tous
les États désignés sauf US)
(72, 75) TAMURA, Kenji [JP/JP]; Showa Denko
K.K., Central Research Laboratory, Kawasaki
Research Laboratory, 3-2, Chidori-cho,
Kawasaki-ku, Kawasaki-shi, Kanagawa
210-0865 (JP). HIRATA, Motoyuki [JP/JP];
Showa Denko K.K., Central Research Laboratory,
Kawasaki Research Laboratory, 3-2,
Chidori-cho, Kawasaki-ku, Kawasaki-shi,
Kanagawa 210-0865 (JP). KANEMARU,
Yoshikazu [JP/JP]; 96-25, Motohachioji-cho
1-chome, Hachioji-shi, Tokyo 193-0826 (JP).
(74) SHIGA, Masatake et al. / etc.; OR Building,
23-3, Takadanobaba 3-chome, Shinjuku-ku,
Tokyo 169-8925 (JP).
(81) AE AG AL AM AT AU AZ BA BB BG BR
BY BZ CA CH CN CO CR CU CZ DE DK
DM DZ EC EE ES FI GB GD GE GH GM
HR HU ID IL IN IS KE KG KR KZ LC LK
LR LS LT LU LV MA MD MG MK MN MW
MX MZ NO NZ PH PL PT RO RU SD SE SG
SI SK SL TJ TM TR TT TZ UA UG US UZ
VN YU ZA ZW.
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ
UG ZW); EA (AM AZ BY KG KZ MD RU
TJ TM); EP (AT BE CH CY DE DK ES FI
FR GB GR IE IT LU MC NL PT SE TR); OA
(BF BJ CF CG CI CM GA GN GQ GW ML
MR NE SN TD TG).
(51) 7 G03F 7/004
(11) WO 02/23274 (13) A2
(21) PCT/US01/28195
(22) 8 Sep/sep 2001 (08.09.2001)
(25) en (26) en
(30) 60/231,640 11 Sep/sep 2000 US
(11.09.2000)
(30) 60/234,652 22 Sep/sep 2000 US
(22.09.2000)
(43) 21 Mar/mar 2002 (21.03.2002)
(54) PHOTORESIST COMPOSITION
COMPOSITION DE PHOTORESIST
(71) SHIPLEY COMPANY, L.L.C. [US/US];
455 Forest Street, Marlborough, MA 01752
(US).
(72) ZAMPINI, Anthony; 43 Wayside Drive,
Westborough, MA 01581 (US).
(74) CAIRNS, S., Matthew et al. / etc.; Edwards
& Angell, LLP, Dike, Bronstein, Roberts &
Cushman, IP Group, P.O. Box 9169, Boston,
MA 02209 (US).
(81) AE AG AL AM AT AU AZ BA BB BG BR
BY BZ CA CH CN CO CR CU CZ DE DK
DM DZ EC EE ES FI GB GD GE GH GM
HR HU ID IL IN IS JP KE KG KP KR KZ
LC LK LR LS LT LU LV MA MD MG MK
MN MW MX MZ NO NZ PH PL PT RO RU
SD SE SG SI SK SL TJ TM TR TT TZ UA
UG UZ VN YU ZA ZW.
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ
UG ZW); EA (AM AZ BY KG KZ MD RU
TJ TM); EP (AT BE CH CY DE DK ES FI
FR GB GR IE IT LU MC NL PT SE TR); OA
(BF BJ CF CG CI CM GA GN GQ GW ML
MR NE SN TD TG).
(51) 7 G03F 7/027, 7/038, 7/004, C08F 290/06,
C08G 59/17, H05K 3/28
(11) WO 02/23275
(21) PCT/JP01/07944
(13) A1
(22) 13 Sep/sep 2001 (13.09.2001)
(25) ja (26) ja
(30) 2000-281034 14 Sep/sep 2000
(14.09.2000)
JP
(30) 2000-282403 18 Sep/sep 2000
(18.09.2000)
JP
(30) 2000-375130 8 Dec/déc 2000
(08.12.2000)
JP
(43) 21 Mar/mar 2002 (21.03.2002)
(54) ULTRAVIOLET-CURING RESIN COM-
POSITION AND PHOTO SOLDER RE-
SIST INK CONTAINING THE SAME
COMPOSITION DE RESINE A SE-
CHAGE ULTRAVIOLET ET ENCRE
RESERVE SOUDURE PHOTO
(71) GOO CHEMICAL CO., LTD. [JP/JP]; 58,
Ijiri, Iseda-cho, Uji-shi, Kyoto 611-0043 (JP).
(for all designated States except / pour tous
les États désignés sauf US)
(72, 75) DAIDO, Hiroko [JP/JP]; c/o Goo Chemical
Co., Ltd., 58, Ijiri, Iseda-cho, Uji-shi,
Kyoto 611-0043 (JP). HASHIMOTO, Soichi
[JP/JP]; c/o Goo Chemical Co., Ltd., 58, Ijiri,
Iseda-cho, Uji-shi, Kyoto 611-0043 (JP).
(74) NISHIKAWA, Yoshikiyo et al. / etc.;
Hokuto Patent Attorneys Office, Umeda-Daiichiseimei
Bldg. 5F, 12-17, Umeda 1-chome,
Kita-ku, Osaka-shi, Osaka 530-0001 (JP).
(81) AE AG AL AM AT AU AZ BA BB BG BR
BY BZ CA CH CN CR CU CZ DE DK DM
DZ EE ES FI GB GD GE GH GM HR HU
ID IL IN IS JP KE KG KP KR KZ LC LK
LR LS LT LU LV MA MD MG MK MN MW
MX MZ NO NZ PL PT RO RU SD SE SG SI
SK SL TJ TM TR TT TZ UA UG US UZ VN
YU ZA ZW.
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ
UG ZW); EA (AM AZ BY KG KZ MD RU
TJ TM); EP (AT BE CH CY DE DK ES FI
FR GB GR IE IT LU MC NL PT SE TR); OA
(BF BJ CF CG CI CM GA GN GQ GW ML
MR NE SN TD TG).
(51) 7 G03F 7/038, 7/004, C08L 79/08
(11) WO 02/23276 (13) A1
(21) PCT/JP01/07876
(22) 11 Sep/sep 2001 (11.09.2001)
(25) ja (26) ja
(30) 2000-318607 12 Sep/sep 2000 JP
(12.09.2000)
(43) 21 Mar/mar 2002 (21.03.2002)
(54) NEGATIVE PHOTOSENSITIVE POLY-
IMIDE COMPOSITION AND METHOD
OF FORMING IMAGE FROM THE
SAME
COMPOSITION PHOTOSENSIBLE DE
POLYIMIDE POUR NEGATIF ET PRO-
CEDE DE FORMATION D’IMAGE AS-
SOCIEE
(71) PI R & D CO., LTD. [JP/JP]; 12-5, Torihamacho,
Kanazawa-ku, Yokohama-shi,
Kanagawa 236-0002 (JP).
(for all designated States except / pour tous
les États désignés sauf US)
(72, 75) ITATANI, Hiroshi [JP/JP]; 17-1-605,
Namiki 1-chome, Kanazawa-ku, Yokohama-shi,
Kanagawa 236-0005 (JP). MAT-
SUMOTO, Shunichi [JP/JP]; 5-51, Tsunishi
2-chome, Kamakura-shi, Kanagawa
248-0034 (JP).
(74) TANIGAWA, Hidejiro; c/o TANIGAWA
AND ASSOCIATES, Patent Firm, 6F, Iwata
Bldg., 5-12, Iidabashi 4-chome, Chiyoda-ku,
Tokyo 102-0072 (JP).
(81) JP US.
(84) EP (AT BE CH CY DE DK ES FI FR GB GR
IE IT LU MC NL PT SE TR).
(51) 7 G03F 7/30
(11) WO 02/23277 (13) A1
(21) PCT/IT00/00358
(22) 12 Sep/sep 2000 (12.09.2000)
(25) en (26) en
(43) 21 Mar/mar 2002 (21.03.2002)
(54) MACHINE FOR THE TREATMENT OF
PRINTING PLATES