section 1 - World Intellectual Property Organization

12/2002
5770 PCT Gazette - Section I - Gazette du PCT 21 Mar/mar 2002
(30) 2000-282047 18 Sep/sep 2000 JP
(18.09.2000)
(30) 2001-68067 12 Mar/mar 2001 JP
(12.03.2001)
(43) 21 Mar/mar 2002 (21.03.2002)
(54) SEMICONDUCTOR BASE MATERIAL
AND METHOD OF MANUFACTURING
THE MATERIAL
MATERIAU DE BASE SEMI-CONDUC-
TEUR ET PROCEDE DE FABRICATION
DUDIT MATERIAU
(71) MITSUBISHI CABLE INDUSTRIES,
LTD. [JP/JP]; 8, Nishinocho, Higashimukaijima,
Amagasaki-shi, Hyogo 660-0856 (JP).
(for all designated States except / pour tous
les États désignés sauf US)
(72, 75) OKAGAWA, Hiroaki [JP/JP]; c/o Itami
Factory of MITSUBISHI CABLE INDUS-
TRIES, LTD., 3, Ikejiri 4-chome, Itami-shi,
Hyogo 664-0027 (JP). TADATOMO,
Kazuyuki [JP/JP]; c/o Itami Factory of MIT-
SUBISHI CABLE INDUSTRIES, LTD., 3,
Ikejiri 4-chome, Itami-shi, Hyogo 664-0027
(JP). OUCHI, Yoichiro [JP/JP]; c/o Itami
Factory of MITSUBISHI CABLE INDUS-
TRIES, LTD., 3, Ikejiri 4-chome, Itami-shi,
Hyogo 664-0027 (JP). TSUNEKAWA,
Takashi [JP/JP]; c/o Itami Factory of MIT-
SUBISHI CABLE INDUSTRIES, LTD., 3,
Ikejiri 4-chome, Itami-shi, Hyogo 664-0027
(JP).
(74) TAKASHIMA, Hajime; Fujimura Yamato
Seimei Bldg., 2-14, Fushimimachi 4-chome,
Chuo-ku, Osaka-shi, Osaka 541-0044 (JP).
(81) CA KR US.
(84) EP (DE FR GB).
(51) 7 H01L 21/28
(11) WO 02/23605 (13) A1
(21) PCT/US01/23580
(22) 26 Jul/juil 2001 (26.07.2001)
(25) en (26) en
(30) 09/660,723 13 Sep/sep 2000 US
(13.09.2000)
(43) 21 Mar/mar 2002 (21.03.2002)
(54) DRY ISOTROPIC REMOVAL OF INOR-
GANIC ANTI-REFLECTIVE COATING
AFTER POLY GATE ETCHING
ENLEVEMENT ISOTROPE A SEC
DE REVETEMENT ANTIREFLET MI-
NERAL APRES GRAVURE DE PLU-
SIEURS GRILLES
(71) ADVANCED MICRO DEVICES, INC.
[US/US]; One AMD Place, Mail Stop 68,
Sunnyvale, CA 94088-3453 (US).
(72) BONSER, Douglas, J.; 5336 Magdelena
Drive, Austin, TX 78735 (US). PURDY,
Matthew; 6307 Bluff Springs Road #731,
Austin, TX 78744 (US). HUSSEY, James,
H., Jr.; 2108 Airole Way, Austin, TX 78704
(US).
(74) DRAKE, Paul, S.; Advanced Micro Devices,
Inc., 5204 East Ben White Boulevard, Mail
Stop 562, Austin, TX 78741 (US).
(81) AE AG AL AM AT AU AZ BA BB BG BR
BY BZ CA CH CN CO CR CU CZ DE DK
DM DZ EE ES FI GB GD GE GH GM HR
HU ID IL IN IS JP KE KG KP KR KZ LC
LK LR LS LT LU LV MA MD MG MK MN
MW MX MZ NO NZ PL PT RO RU SD SE
SG SI SK SL TJ TM TR TT TZ UA UG UZ
VN YU ZA ZW.
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ
UG ZW); EA (AM AZ BY KG KZ MD RU
TJ TM); EP (AT BE CH CY DE DK ES FI
FR GB GR IE IT LU MC NL PT SE TR); OA
(BF BJ CF CG CI CM GA GN GQ GW ML
MR NE SN TD TG).
Published / Publiée :(c)
(51) 7 H01L 21/306, H01H 3/00
(11) WO 02/23606 (13) A1
(21) PCT/US01/28614
(22) 12 Sep/sep 2001 (12.09.2001)
(25) en (26) en
(30) 60/231,543 11 Sep/sep 2000 US
(11.09.2000)
(30) 60/231,529 11 Sep/sep 2000 US
(11.09.2000)
(30) PCT/US01/22661 18 Jul/juil 2001 US
(18.07.2001)
(43) 21 Mar/mar 2002 (21.03.2002)
(54) DUAL POSITION LINEAR DISPLACE-
MENT MICROMECHANISM
MICROMECANISME DE DEPLACE-
MENT LINEAIRE A DOUBLE POSI-
TION
(71) BRIGHAM YOUNG UNIVERSITY
[US/US]; P.O. Box 21231, A-285 ASB,
Provo, UT 84062 (US).
(for all designated States except / pour tous
les États désignés sauf US)
(72, 75) HOWELL, Larry [US/US]; 1624 North
Main, Orem, UT 84057 (US). LYON, Scott
[US/US]; 1960 North Canyon Road, #40,
Provo, UT 84604 (US). WEIGHT, Brent
[US/US]; 417 North 600 East, Springville,
UT 84663 (US). CLEMENTS, Deanne
[US/US]; 2450 Sycamore Lane, #14B West,
Lafayette, IN 47906 (US).
(74) WITT, Evan; MADSON & METCALF, 15
West South Temple, Suite 900, Salt Lake City,
UT 84101 (US).
(81) AE AG AL AM AT AU AZ BA BB BG BR
BY BZ CA CH CN CO CR CU CZ DE DK
DM DZ EC EE ES FI GB GD GE GH GM
HR HU ID IL IN IS JP KE KG KP KR KZ
LC LK LR LS LT LU LV MA MD MG MK
MN MW MX MZ NO NZ PH PL PT RO RU
SD SE SG SI SK SL TJ TM TR TT TZ UA
UG US UZ VN YU ZA ZW.
Declaration / Déclaration :
(u) for / pour US only / seulement
(51) 7 H01L 21/3063
(11) WO 02/23607
(21) PCT/US01/28934
(13) A1
(22) 14 Sep/sep 2001 (14.09.2001)
(25) en (26) en
(30) 09/662,682 15 Sep/sep 2000
(15.09.2000)
US
(43) 21 Mar/mar 2002 (21.03.2002)
(54) METAL-ASSISTED CHEMICAL ETCH
POROUS
METHOD
SILICON FORMATION
PROCEDE DE FORMATION DE SILI-
CIUM POREUX PAR GRAVURE CHI-
MIQUE ASSISTEE PAR UN METAL
(71) THE BOARD OF TRUSTEES OF THE
UNIVERSITY OF ILLINOIS [US/US];
352 Henry Administration Building, Urbana,
IL 61801 (US).
(72) LI, Xiuling; 2712 Prairie Meadow Drive,
Champaign, IL 61821 (US). BOHN, Paul,
W.; 2413 Longmeadow Lane, Champaign,
IL 61822 (US). SWEEDLER, Jonathan, V.;
1502 Hillcrest Street, Urbana, IL 6122 (US).
(74) FALLON, Steven, P.; Greer, Burns & Crain,
Ltd., Suite 2500, 300 South Wacker Drive,
Chicago, IL 60606 (US).
(81) AE AG AL AM AT AU AZ BA BB BG BR
BY BZ CA CH CN CR CU CZ DE DK DM
DZ EE ES FI GB GD GE GH GM HR HU
ID IL IN IS JP KE KG KP KR KZ LC LK
LR LS LT LU LV MA MD MG MK MN MW
MX MZ NO NZ PL PT RO RU SD SE SG SI
SK SL TJ TM TR TT TZ UA UG UZ VN YU
ZA ZW.
(84) AP (GH GM KE LS MW MZ SD SL SZ TZ
UG ZW); EA (AM AZ BY KG KZ MD RU
TJ TM); EP (AT BE CH CY DE DK ES FI
FR GB GR IE IT LU MC NL PT SE TR); OA
(BF BJ CF CG CI CM GA GN GQ GW ML
MR NE SN TD TG).
(51) 7 H01L 21/3065, 21/205, C23C 16/44
(11) WO 02/23608
(21) PCT/JP01/07782
(13) A1
(22) 7 Sep/sep 2001 (07.09.2001)
(25) ja (26) ja
(30) 2000-275647 11 Sep/sep 2000
(11.09.2000)
JP
(30) 2001-261471 30 Aug/août 2001
(30.08.2001)
JP
(43) 21 Mar/mar 2002 (21.03.2002)
(54) CLEANING GASSES AND ETCHING
GASES
GAZ DE NETTOYAGE ET GAZ D’AT-
TAQUE
(71) RESEARCH INSTITUTE OF INNOVA-
TIVE TECHNOLOGY FOR THE EARTH
[JP/JP]; 2, Kizugawa-dai 9-chome, Kizu-cho,
Souraku-gun, Kyoto 619-0292 (JP). NA-
TIONAL INSTITUTE OF ADVANCED
INDUSTRIAL SCIENCE AND TECH-
NOLOGY [JP/JP]; 3-1, Kasumigaseki
1-chome, Chiyoda-ku, Tokyo 100-8921 (JP).
(for all designated States except / pour tous
les États désignés sauf US)
(72, 75) SEKIYA, Akira [JP/JP]; c/o Tsukuba
Center NATIONAL INSTITUTE OF
ADVANCED INDUSTRIAL SCIENCE
AND TECHNOLOGY, 1-1-1, Higashi,
Tsukuba-shi, Ibaraki 305-8565 (JP). MIT-
SUI, Yuki [JP/JP]; c/o RESEARCH INSTI-
TUTE OF INNOVATIVE TECHNOLOGY
FOR THE EARTH, 11-6, Nishi-Shimbashi
2-chome, Minato-ku, Tokyo 105-0003
(JP). TOMIZAWA, Ginjiro [JP/JP]; c/o
DAIKIN INDUSTRIES, LTD., 3, Miyukigaoka,
Tsukuba-shi, Ibaraki 305-0841 (JP).
FUKAE, Katsuya [JP/JP]; c/o Shibukawa
Laboratory KANTO DENKA KOGYO
CO., LTD., 1497, Shibukawa-shi, Gunma
377-8513 (JP). OHIRA, Yutaka [JP/JP]; c/o
RESEARCH INSTITUTE OF INNOVATIVE
TECHNOLOGY FOR THE EARTH, 11-6,