TIMARIS - Singulus Technologies AG

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10 Static-PVD-Module (sPVD-M) Static-PVD-Module The Static-PVD-Module (sPVD-M) comprises a standard magnetron cathode with optimized target utilization for high rate sputter deposition of metallic and nonconducting materials for multiple applications. DC magnetron as well as RF magnetron sputter modes are selectable through a recipe menu. The module is envisaged to be used for deposition of films with high deposition rate that do not require the extremely high uniformity that can be achieved by the LDD technology. Details: _ DC and RF sputter deposition selectable by recipe _ Variable distance between substrate and sputter target _ Ultra-High-Vacuum technology, base pressure < 1*10 -8 Torr
Combination-Process-Module The Combination-Process-Module (CPM) comprises both technologies, of oxidation and pre-clean in one module. This is a cost-efficient option, since only one module for two process steps is required. It is mainly envisaged for R&D purposes, where a high throughput is of less importance. The process performance is identical with the Oxidation- Module and the Pre-Clean-Module. Combi-Process-Module (CPM) Details: _ Low energy remote plasma oxidation _ Natural oxidation _ Surface treatment by low energetic ions _ Wafer cleaning, removal of native oxides by sputter etch _ Variable distance between substrate and ion source _ Ultra-High-Vacuum technology, base pressure < 1*10 -8 Torr 11
Page 1 and 2: TIMARIS PVD Cluster Tool for Magnet
Page 3 and 4: Multi Target Module Top: Target Dru
Page 5 and 6: Multi-Target-Module with 10 DC/RF C
Page 7 and 8: Rotating-Substrate-Module (RSM) The
Page 9: Oxidation-Process-Module The Oxidat
Page 13: TIMARIS configuration for 300 mm MR
Page 16: Headquarters SINGULUS TECHNOLOGIES

TIMARIS - Singulus Technologies AG

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