Development of a New Electro-thermal Simulation Tool for RF circuits
Development of a New Electro-thermal Simulation Tool for RF circuits
Development of a New Electro-thermal Simulation Tool for RF circuits
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24 2.3. Analytical <strong>thermal</strong> model<br />
1. The region where power is dissipated is approximated by a simple geometry. Two<br />
models have been adopted:<br />
➤ THS model – an infinetly thin rectangle, Thin Heat Source model (Fig.<br />
2.12b). This case is described in section 2.3.1.<br />
➤ VHS model – a parallelepiped with finite thickness, Volume Heat Source<br />
model (Fig. 2.12a). This case is described in section 2.3.2.<br />
2. Power density is uni<strong>for</strong>m within the heat source region and zero outside the<br />
region.<br />
3. Boundary Conditions are neglected in all directions except the top surface, where<br />
adiabatic boundary condition is set. The image function method is used to solve<br />
the steady-state heat-flow equation.<br />
4. The geometry <strong>of</strong> the heat source is independent on bias conditions.<br />
2.3.1. Case <strong>of</strong> rectangular heat source (THS)<br />
Figure 2.13: Thermal model <strong>of</strong> an integrated device. The chip is a right parallelepiped<br />
with a rectangular heat source <strong>of</strong> dimensions WL located at the depth zs from the<br />
surface and centred around the point (xs, ys, zs).<br />
To develop a solution as a first step adiabatic boundary condition at the top surface<br />
is neglected. The temperature distribution in an infinite domain with a THS at a point<br />
P=(x,y,z) is given by [35] :<br />
θ(x, y, z) = qs<br />
4πk [g(δx2, δy2, δz) − g(δx2, δy1, δz) − g(δx1, δy2, δz) + g(δx1, δy1, δz)]<br />
(2.40)