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Book of abstracts - Euro-MBE 2011 - CNRS

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Mo2.3<br />

In content (%)<br />

40<br />

30<br />

20<br />

10<br />

0<br />

Exp.<br />

Sim.<br />

growth direction<br />

L lower<br />

= 1.35 ML<br />

L upper<br />

= 1.35 ML<br />

20 40 60 80<br />

Position (ML)<br />

Fig 1: Experimentally determined In pr<strong>of</strong>ile for a (In,Ga)As/GaAs QW grown on GaAs(001) in the 2D<br />

island nucleation mode. Solid line: simulated pr<strong>of</strong>ile where the interfaces are defined by a sigmoidal<br />

function. L lower and L upper denote the width <strong>of</strong> the lower and upper interface, respectively.<br />

In content (%)<br />

30<br />

25<br />

20<br />

15<br />

10<br />

5<br />

(b)<br />

Exp.<br />

Sim.<br />

growth direction<br />

L lower<br />

= 2.6 ML<br />

L upper<br />

= 4.2 ML<br />

0<br />

-60 -40 -20 0 20 40 60<br />

Position (ML)<br />

Fig 2: (a) g 002 DF TEM micrograph <strong>of</strong> a (In,Ga)As/GaAs QW on GaAs(111)B, which has been grown in the step flow<br />

mode. (b) Experimental In distribution and simulated pr<strong>of</strong>ile, where the interfaces are defined by a sigmoidal function<br />

30<br />

Exp.<br />

Sim.<br />

L lower<br />

= 1.8 ML<br />

L upper<br />

= 1.8 ML<br />

In content (%)<br />

20<br />

10<br />

growth direction<br />

0<br />

-20 0 20<br />

Position (ML)<br />

Fig 3: Experimentally determined In pr<strong>of</strong>ile for a (In,Ga)As/GaAs QW grown on GaAs(001) by SPE<br />

and simulated pr<strong>of</strong>ile, where the interfaces are defined by a sigmoidal function.

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