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Lithography• Example: which is the critical dimension that can be achieved withλ=248 nm?Reasonable NA for air is 0,8Guess k 1 =0,4248nmresolution = 0,4 = 124nm0,8• Example: which is the critical dimension that can be achieved withλ=193 nm?Reasonable NA for air is 0,8Guess k 1 =0,3193nmresolution = 0,3 = 72nm0,8Lithography• 436 nm: used down to 3 µm technologies• 365 nm: used down to 0,6 µm technologies• 248 nm: used down to 130 nm technologies• 193 nm in air (dry lithography)Used in technologies down to 90 nm(still in use for some layers in 65 nm, 45 nm...)