Simulation of Lithography with SolidWorks - Foundation Coalition

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Figure 15. We want this mask. Light will not pass through the letters. Thatmeans the negative resist will set and remain after development. Therefore, use thepositive mask in solidworks.Figure 16. The ‘wrong’ mask generates the correct result for a negative resist.Positive MaskFigure 17. The ‘wrong’ mask generates the correct result for a negative resistwith two Expose/Develop steps. The second step takes care of the As.040920TSCD_SimulationsSolidworksB.doc 10Last printed 3/13/2005 5:06 PM
EtchEtch chemical target specific materials.WETWet etches are aqueous solutions that chemically attack a surface.IsotropicThese etches attack a target material uniformly. Etch chemistry 1 :Solution Target Etch Rate (nm/min)HF 49% SiO2 2300Phosphosilicate Glass 3600Silicon etch Si 310Acetone Photoresist 4000You can use any material as a mask if the etchant does not attack that material. Insome processes Si, SiO2, photoresist, and SiN can act as a mask for some other material.The isotropic etch eats under the mask. We will simulate it as a straight etch.Simulate the isotropic etch by these steps:NOTE: Don’t etch the stepped edge of the wafer. Those layers are there for gradingand checks of your process. Only etch in the masked region.Apply the mask pattern to the layer that you wish to etch.Extrude cut Blind, into the layer for the layer depth.Orientation Dependent Etch (ODE)ODE attacks specific crystal planes. In Si the etch stops on the {111} planes andattacks the {100} planes 100 times faster. The draft angle is 54.7°.If you etch deep enough the Si cavity will converge at a point.Boron Etch Stop (Mask)DRYArgon Sputter Etch1 Kalpakjian040920TSCD_SimulationsSolidworksB.doc 11Last printed 3/13/2005 5:06 PM
Page 1 and 2: SIMULATION OF LITHOGRAPHY/MEMS/NEMS
Page 3 and 4: Figure 3. Set the color to the corr
Page 5 and 6: Figure 6. Positive photoresist over
Page 7 and 8: POSITIVE RESISTPositive MaskFigure
Page 9: Figure 13. This negative mask requi

Simulation of Lithography with SolidWorks - Foundation Coalition

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