DS 7-7R 17-12R Semiconductor Fabrication Facilities ... - FM Global

7-7R
REFERENCE DOCUMENT
17-12R SEMICONDUCTOR FABRICATION FACILITIES
Page 2
4.3 SEMI S-2 ....................................................................................................................................... 29
4.4 International Codes ........................................................................................................................ 30
4.5 ISO International Cleanroom Standards ........................................................................................ 31
4.5.1 ISO 14644-1 Air Cleanliness Classification .......................................................................... 32
5.0 SEMICONDUCTOR TERMINOLOGY .................................................................................................. 33
6.0 BIBLIOGRAPHY ................................................................................................................................... 38
List of Figures
Fig. 1. Process gas distribution arrangements ............................................................................................. 4
Fig. 2. Wet bench free burn test. ................................................................................................................. 13
Fig. 3. Flow diagram of semiconductor fabrication. ..................................................................................... 17
Fig. 4. Semiconductor fabrication facility systems diagram. ........................................................................ 18
Fig. 5. Clean bay service aisle. .................................................................................................................... 22
Fig. 6. Tool service corridor. ......................................................................................................................... 23
Fig. 7. Various arrangements of a wet bench and associated fume exhaust ductwork. ............................ 24
List of Tables
Table 1. Gases Used in Fabrication ............................................................................................................. 5
Table 2. Silane Mixtures ................................................................................................................................. 6
Table 3. Flammable and Combustible Liquids Used in Fabrication .............................................................. 8
Table 4. Process Reactions ........................................................................................................................... 9
Table 5. Vacuum Applications Used in Fabrication ...................................................................................... 10
Table 6. Material Nomenclature and Use .................................................................................................... 14
Table 7. Common Nonflammable Semiconductor Process Liquids ........................................................... 26
Table 8. Possible Water Damage Sources ................................................................................................. 27
Table 9. Selected airborne particulate cleanroom classes for cleanrooms and cleanzones
defined by ISO 14644-1 ................................................................................................................. 32
Table 10. Comparison between different Cleanroom Class Standards ....................................................... 32
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