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DRAM Technology

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Scaling<br />

1. Design Rule<br />

. 80nm → 60nm → 40nm<br />

. Resolution<br />

2. Cell Layout<br />

. 16F 2 → 8F 2 → 6F 2 → 4F 2<br />

3. Chip Design<br />

. Cell Efficiency<br />

. Chip Architecture<br />

Wavelength Wavelength (nm) (nm)<br />

436<br />

365<br />

365<br />

248<br />

248<br />

193<br />

193<br />

Optical<br />

(Ultraviolet)<br />

DUV : Deep Ultraviolet<br />

VUV : Vacuum Ultraviolet<br />

EUV : Extreme Ultraviolet<br />

157<br />

126<br />

광원의 g-line i-line i-line line KrF KrF<br />

종류<br />

ArF ArF F 2 Ar 2<br />

DUV VUV<br />

13<br />

Non-Optical<br />

1 4x10-3 5x10-5 1 4x10-3 5x10-5 EUV XRL EPL IPL<br />

<strong>DRAM</strong> <strong>Technology</strong> SK hynix Lecture for POSTECH<br />

Page 33

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