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FILM THICKNESS MEASUREMENT (SCI FilmTek 2000)

FILM THICKNESS MEASUREMENT (SCI FilmTek 2000)

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2 Unless you will use a stored recipe and don’t need to make any changes,<br />

you will need to log in as a power user. To do so, click on “Security” on<br />

the pull down menu and select “Log-in”. Type in User Name: <strong>SCI</strong> and<br />

the password located on the cover of the <strong>FilmTek</strong> manual. Also select<br />

“Power user” (Fig 4).<br />

Fig 4. Log in screen<br />

3 Click the recipe pull down menu at the bottom right of the screen and<br />

scroll to the desired program.<br />

Programs will have a descriptive name for the film and substrate to be<br />

measured as well as a suffix UV, vis (visible) or ir for the appropriate<br />

wavelength range. The microscope must be set up correctly for the<br />

wavelength range being measured as well. If the desired recipe does not<br />

exist contact lab staff or the appropriate engineer to assist in designing a<br />

program. In some cases samples may need to be sent to <strong>SCI</strong> for initial<br />

characterization. In all cases a known standard must be used to<br />

insure that meaningful measurements are being taken.<br />

4 Make sure the appropriate lamp is on (section 5.1.1 and 5.1.2). The<br />

microscope lamp should always be on for sample viewing and as a<br />

visible/ir source.<br />

5 Choose the appropriate objective lens (silver for visible/IR, black for UV)<br />

and position the light beam over the center hole in the wafer stage with<br />

NO SAMPLE.<br />

6 If you are using UV also make sure the UV-vis shutter is “out”. For visible<br />

and IR it should be “in”.<br />

7 For IR, choose “Calibration”->”NIR Settings” and click the enable box at<br />

the bottom left. The integration time may be changed here as well (see<br />

step 11).<br />

8 Press the “Background” button in the toolbar (2 nd button from the left). A<br />

graph with a red line at 0 should be displayed.<br />

This step is to zero the machine taking into account ambient and stray light. It<br />

should be done hourly or whenever a recipe is changed.<br />

9 Place the <strong>SCI</strong> silicon reference wafer shiny side up on the microscope<br />

stage and position the wafer under one of the visible (silver) objectives.<br />

Focus on a clean spot on the wafer so that the field diaphragm presents a<br />

nice sharp edge. UV-vis shutter should be in.<br />

10 For UV: Select the black objective lens, pull out the UV-vis shutter and<br />

press “Reference” on the toolbar (leftmost icon-Fig 3). For visible/IR:<br />

Simply press “Reference” on the toolbar (leftmost icon-Fig 3). Press<br />

6

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