Nano-Lithography - KTH
Nano-Lithography - KTH
Nano-Lithography - KTH
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Increase NA<br />
R<br />
=<br />
k<br />
1<br />
λ<br />
NA<br />
Lens fabrication<br />
Immersion <strong>Lithography</strong><br />
λ [nm]<br />
436<br />
365<br />
248<br />
193<br />
NA<br />
0.15-0.45<br />
0.35-0.60<br />
0.35-0.82<br />
0.60-0.93<br />
n<br />
n H O<br />
α<br />
H 2<br />
O<br />
Numerical Aperture<br />
NA=n sin α<br />
= 1.44 ⇒ NA ≈1.36<br />
2<br />
Expected in production during 2006<br />
State of the Art: λ=193 nm, NA=0.93, k 1 =0.3 ⇒ R≈60 nm<br />
Per-Erik Hellstöm, Docent Lecture 14 th of February 2006<br />
16