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Nano-Lithography - KTH

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Increase NA<br />

R<br />

=<br />

k<br />

1<br />

λ<br />

NA<br />

Lens fabrication<br />

Immersion <strong>Lithography</strong><br />

λ [nm]<br />

436<br />

365<br />

248<br />

193<br />

NA<br />

0.15-0.45<br />

0.35-0.60<br />

0.35-0.82<br />

0.60-0.93<br />

n<br />

n H O<br />

α<br />

H 2<br />

O<br />

Numerical Aperture<br />

NA=n sin α<br />

= 1.44 ⇒ NA ≈1.36<br />

2<br />

Expected in production during 2006<br />

State of the Art: λ=193 nm, NA=0.93, k 1 =0.3 ⇒ R≈60 nm<br />

Per-Erik Hellstöm, Docent Lecture 14 th of February 2006<br />

16

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