Nano-Lithography - KTH

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Nano-Lithography Feature size < 100 nm Resist Per-Erik Hellstöm, Docent Lecture 14 th of February 2006 2
• Nano-scale devices • Basics of optical lithography • Advanced optical lithography • Nano-lithography for low volume applications • Summary Per-Erik Hellstöm, Docent Lecture 14 th of February 2006 3
Page 1: Nano-Lithography -Patterning techni
Page 5 and 6: Nano-wires in sensor application EK
Page 7 and 8: Lithography specifications Resoluti
Page 9 and 10: Projection Lithography Intensity at
Page 11 and 12: Projection Lithography Light source
Page 13 and 14: Shorter wavelength R = k 1 λ NA λ
Page 15 and 16: Reduce resolution factor k 1 Resist
Page 17 and 18: Minimum feature size Production 200
Page 19 and 20: • Nano-scale devices • Basics o
Page 21 and 22: Resolution of EB lithography • Hi
Page 23 and 24: Nano Imprint Lithography • Step a
Page 25 and 26: Sidewall Transfer Lithography Proce
Page 33 and 34: Sidewall Transfer Lithography Line
Page 35: Summary Ideal Advanced Optical Elec

Nano-Lithography - KTH

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