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Nano-Lithography - KTH

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Summary<br />

Ideal<br />

Advanced<br />

Optical<br />

Electron<br />

Beam<br />

<strong>Nano</strong><br />

Imprint<br />

Sidewall<br />

Transfer<br />

Resolution<br />

Good<br />

Good<br />

Good<br />

Good<br />

Good<br />

Pattern shape<br />

Any<br />

Any<br />

Any<br />

Any<br />

Lines/<br />

Rings<br />

Large & small<br />

patterns<br />

Yes<br />

Yes<br />

No<br />

Yes<br />

Yes<br />

Alignment<br />

Good<br />

Good<br />

Good<br />

Poor<br />

Good<br />

Throughput<br />

High<br />

High<br />

Low<br />

Medium<br />

High<br />

Initial cost<br />

Low<br />

High<br />

Medium<br />

Low<br />

Low<br />

Running cost<br />

Low<br />

High<br />

Low<br />

Medium<br />

Low<br />

Per-Erik Hellstöm, Docent Lecture 14 th of February 2006<br />

35

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