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Ferromagnetic (Ga,Mn)As Layers and ... - OPUS Würzburg

Ferromagnetic (Ga,Mn)As Layers and ... - OPUS Würzburg

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10 Summary<br />

classical continuum mechanics on a 3D grid in an arbitrarily defined geometry. With<br />

this tool we can predict the strain in complex structures <strong>and</strong> optimize them with respect<br />

to parameters such as etch depth, aspect ratios, <strong>and</strong> alignment with respect to<br />

crystal axes. One structure which is easy to fabricate <strong>and</strong> offers a large anisotropy in<br />

lattice strain for two orthogonal crystal directions is a narrow but very long stripe.<br />

In its most simple form, the anisotropic strain is caused by selective relaxation of<br />

the compressive strain of the (<strong>Ga</strong>,<strong>Mn</strong>)<strong>As</strong> layer perpendicular to the stripe axis. A<br />

more sophisticated setup is the inclusion of a highly strained (In,<strong>Ga</strong>)<strong>As</strong> layer below<br />

the (<strong>Ga</strong>,<strong>Mn</strong>)<strong>As</strong>. With this stressor layer it becomes possible to induce tensile strain<br />

perpendicular to the stripe direction into the (<strong>Ga</strong>,<strong>Mn</strong>)<strong>As</strong> layer, while still retaining<br />

the pseudomorphic (compressively strained) condition along the stripe.<br />

The strain predictions of the finite element simulations are verified to be accurate<br />

by two HRXRD techniques on various stripe arrays. Magnetically, the stripes show a<br />

very clear response to the patterning induced strain anisotropy. Both SQUID <strong>and</strong> magnetotransport<br />

measurements reveal a replacement of the in-plane biaxial anisotropy of<br />

the as-grown layer by a single global uniaxial easy axis along the stripe direction for<br />

[100] oriented stripes. For stripes oriented along the [1¯10] direction, the easy axis is<br />

tilted away from its original position in the parent layer towards the stripe direction.<br />

This behavior is strengthened by annealing the sample for several hours to increase the<br />

carrier concentration. By comparison between different stripes as well as calculating<br />

its expected contribution, we can rule out shape anisotropy as a significant force in<br />

the anisotropy behavior in (<strong>Ga</strong>,<strong>Mn</strong>)<strong>As</strong>. The observations for both stripe directions<br />

can also be explained theoretically. After calculating the b<strong>and</strong> structure in a k · p<br />

formalism (taking into account the spin-orbit coupling <strong>and</strong> strain), it is possible to<br />

determine the magnetic anisotropy by filling up all available b<strong>and</strong>s in the 3D k-space<br />

up to the Fermi energy. When the resulting energy l<strong>and</strong>scape for a [100] oriented stripe<br />

is plotted for different sets of increasing strain values, we observe that the easy axis<br />

perpendicular to the stripe direction is replaced by a hard axis. A single uniaxial easy<br />

axis appears when around 50% of the compressive lattice strain is relaxed, which is<br />

easily achieved in all the presented stripe structures. We also present a simple model<br />

which qualitatively describes the anisotropy behavior for both stripe alignments. The<br />

model is based on magnetostatic energy calculations [Papp 07b], modified to take an<br />

additional strain term into account.<br />

The final section of this thesis shows an example of an application of engineered<br />

anisotropies in (<strong>Ga</strong>,<strong>Mn</strong>)<strong>As</strong> as a non-volatile all-semiconductor memory storage device.<br />

Two orthogonal nanobars are connected via a narrow constriction. Four different<br />

magnetization states can be ‘written’ in the form of magnetization alignment in the<br />

bars. Readout of the device occurs by measuring the voltage drop over the constriction.<br />

More sophisticated versions of this device are under investigation <strong>and</strong> we expect that<br />

the technique of lithographically engineered strain relaxation will prove to be a very<br />

valuable tool for future device applications as well as fundamental research in the<br />

(<strong>Ga</strong>,<strong>Mn</strong>)<strong>As</strong> material system.

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