Top-down and Bottom-up Approaches to Nanoscale Fabrication
Top-down and Bottom-up Approaches to Nanoscale Fabrication
Top-down and Bottom-up Approaches to Nanoscale Fabrication
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Fundamental Limitations<br />
• Smallest Feature Size is limited by<br />
wave length of light used<br />
• Currently deep UV light is used <strong>to</strong> produce<br />
sub-µm line widths<br />
• Moving in<strong>to</strong> X-ray may allow further reduction<br />
• This has practical complications, e.g. lenses<br />
17-040503TSCD
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