Top-down and Bottom-up Approaches to Nanoscale Fabrication

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X-Ray Lithography Example 18-040503TSCD
E-Beam Lithography •Smallest Feature Size of optical lithography is limited by wave length of light • Use a smaller wave length! • Use electrons! • Quantum Mechanics ⇒ all particles have a wave length • Higher energy ⇒ lower wave length Example 19-040503TSCD
Page 1 and 2: Nanoscale Issues in Materials & Man
Page 3 and 4: Module 2: Nanoscale Issues Top-dow
Page 5 and 6: Two principal approaches Top-Down
Page 7 and 8: Lithography in the Arts • Invente
Page 9 and 10: Lithography, to date Miniaturized c
Page 11 and 12: Optical Lithography Mask Photoresis
Page 13 and 14: Optical Lithography 13-040503TSCD
Page 15 and 16: Example: Pentium III Low Magnificat
Page 17: Fundamental Limitations • Smalles
Page 21 and 22: Electron Beam Lithography 21-040503
Page 27 and 28: Current Capabilities • Use either
Page 29 and 30: Dip-Pen Lithography 29-040503TSCD
Page 31 and 32: Nanoscale Issues in Materials & Man
Page 33 and 34: Bottom-Up - How? • Molecular Asse
Page 35 and 36: Self Assembly Making What? 35-04050
Page 37 and 38: 37-040503TSCD
Page 39 and 40: Ethical Consideration 39-040503TSCD
Page 41 and 42: Equal Channel Angular Extrusion Sol
Page 43: ECAE Effect Nanoparticles become bu

Top-down and Bottom-up Approaches to Nanoscale Fabrication

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