Top-down and Bottom-up Approaches to Nanoscale Fabrication
Top-down and Bottom-up Approaches to Nanoscale Fabrication
Top-down and Bottom-up Approaches to Nanoscale Fabrication
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Current Capabilities<br />
• Use either dedicated e-beam writer or SEM (Vacuum<br />
environment)<br />
• 30nm line width is straightforward<br />
•
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