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Top-down and Bottom-up Approaches to Nanoscale Fabrication

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Lithography, <strong>to</strong> date<br />

Miniaturized computing circuits require mass<br />

manufacturing of small features ⇒ push<br />

lithographic approach <strong>to</strong> new limits<br />

Some lithography approaches for manufacturing<br />

Optical lithography (including ultraviolet)<br />

X-Ray lithography<br />

Electron Beam lithography<br />

Ion Beam lithography<br />

“Dip-Pen” lithography<br />

…<br />

9-040503TSCD

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