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QUALITY and RELIABILITY<br />

Figure 9. General Wafer Fabrication Flow<br />

Process Flow Process Step Major Control Item<br />

II<br />

Wafer and Mask<br />

Input<br />

Starting Material<br />

Incoming Inspection<br />

Mask: (See mask Inspection)<br />

Wafer: (See wafer Inspection)<br />

Wafer Sorting and<br />

Labelling<br />

Resistivity<br />

I<br />

I<br />

Initial Oxidation<br />

Photo<br />

Inspection<br />

Oxide Thickness<br />

• (See manufacturing section)<br />

• (See FAB, QC Monitor/gate)<br />

• Critical Dimension<br />

• Visual/Mech - Major: AQL 1.0%<br />

- Minor: AQL 6.5%<br />

QC Gate<br />

• Critical Dimension<br />

Ditt'n<br />

Metal<br />

6<br />

Etch<br />

• (See manufacturing section)<br />

• (See FAB, QC Monitor/gate)<br />

Inspection<br />

• Critical Dimension<br />

• Visual/Mech - Major: AQL 1.0%<br />

- Minor: AQL 6.5%<br />

QC Gate<br />

• Critical Dimension<br />

• Visual/Mech<br />

y<br />

E·test<br />

Diffusion<br />

Metalization<br />

• (See in·process Quality Inspection)<br />

• Electrical Characteristics<br />

c8SAMSUNG 29

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