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Kinetic and Strain-Induced Self-Organization of SiGe ...

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10 CHAPTER 1. SILICON-GERMANIUM MATERIAL SYSTEM<br />

Silicon (Si)<br />

Figure 1.8: B<strong>and</strong> structures for the most prominent group IV semiconductors<br />

Si (a) <strong>and</strong> Ge (b), both featuring an indirect b<strong>and</strong>gap [12, 20].<br />

� Source: <strong>SiGe</strong> b<strong>and</strong>structure.jpg<br />

In Si the conduction b<strong>and</strong> is characterized by six equivalent minima along the 〈100〉-directions<br />

<strong>of</strong> the Brillouin zone located at about k0 = 0.85 (2π/a). The constant energy surfaces are<br />

ellipsoids <strong>of</strong> revolution with major axes along 〈100〉. The valence b<strong>and</strong> <strong>of</strong> Si has its minimum<br />

at the Γ-point where the warped heavy <strong>and</strong> light hole b<strong>and</strong>s are degenerate. The indirect<br />

gap energy Eg,ind is 1.12 eV (300 K). In Fig. 1.8 [12, 20] the Si b<strong>and</strong> structure <strong>and</strong> the indirect<br />

b<strong>and</strong> gap are shown. [3]<br />

Germanium (Ge)<br />

In Ge the conduction b<strong>and</strong> is characterized by eight equivalent minima at the end points <strong>of</strong><br />

the 〈111〉-directions <strong>of</strong> the Brillouin zone <strong>and</strong> the constant energy surfaces are ellipsoids <strong>of</strong><br />

revolution with major axes along 〈111〉. The valence b<strong>and</strong> <strong>of</strong> Ge has its minimum, like Si, at<br />

the Γ point. The indirect gap energy <strong>of</strong> Ge is with Eg,ind = 0.66 eV (291 K) smaller than in<br />

Si (see also Fig. 1.8 [12, 20] for the Ge b<strong>and</strong> structure).<br />

In Tab. 1.1 some important properties for Group IV elements are listed. For the sake <strong>of</strong><br />

completeness additionally to Si <strong>and</strong> Ge also values for carbon (diamond) are tabulated. [3]

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