Kinetic and Strain-Induced Self-Organization of SiGe ...

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iv PREFACE
Contents Preface i Eidesstattliche Erklärung . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . i Kurzfassung . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . ii Abstract . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . iii I Basics 1 1 Silicon-Germanium Material System 3 1.1 Structural Properties . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 4 1.1.1 Crystal Orientation and Miller Indices . . . . . . . . . . . . . . . . . . 5 1.2 Vicinal Si(001) . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 6 1.2.1 Step Structure . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 7 1.2.2 Step Types in Different Miscut Angle Regimes . . . . . . . . . . . . . 8 1.3 Electronic Properties . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 9 1.3.1 Band Structure . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 9 1.4 Silicon Germanium Alloys (Si1−xGex) . . . . . . . . . . . . . . . . . . . . . . 12 1.4.1 Bandstructure of SiGe-Heterostructures . . . . . . . . . . . . . . . . . 12 2 Molecular Beam Epitaxy (MBE) 15 2.1 MBE-Growth . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 15 2.1.1 Fundamentals and Prerequisites . . . . . . . . . . . . . . . . . . . . . 15 2.1.2 Physical Processes in the Growth-Chamber . . . . . . . . . . . . . . . 17 v
Page 1: J O H A N N E S K E P L E R U N I V
Page 4 and 5: ii PREFACE Kurzfassung Eine kinetis
Page 8 and 9: vi CONTENTS 2.1.3 Growth-Modes . .
Page 10 and 11: viii CONTENTS B General Physical Da
Page 13 and 14: Chapter 1 Silicon-Germanium Materia
Page 15 and 16: 1.1. STRUCTURAL PROPERTIES 5 Figure
Page 17 and 18: 1.2. VICINAL SI(001) 7 Vicinal subs
Page 19 and 20: 1.3. ELECTRONIC PROPERTIES 9 Monoat
Page 21 and 22: 1.3. ELECTRONIC PROPERTIES 11 Silic
Page 23 and 24: 1.4. SILICON GERMANIUM ALLOYS (SI1
Page 25 and 26: Chapter 2 Molecular Beam Epitaxy (M
Page 27 and 28: 2.1. MBE-GROWTH 17 hit the substrat
Page 29 and 30: 2.1. MBE-GROWTH 19 Figure 2.3: The
Page 31 and 32: 2.2. CLEANING PROCEDURE 21 rameter
Page 33 and 34: 2.2. CLEANING PROCEDURE 23 H2SO4 :
Page 35 and 36: 2.3. MBE-SYSTEM 25 Figure 2.7: All-
Page 37 and 38: 2.3. MBE-SYSTEM 27 Figure 2.9: Sche
Page 39 and 40: Chapter 3 Methods of Investigation
Page 41 and 42: 3.2. SCANNING ELECTRON MICROSCOPY (
Page 43 and 44: 3.3. ATOMIC FORCE MICROSCOPY (AFM)
Page 51: Part II Main Research 41
Page 54 and 55: 44 CHAPTER 4. SELF-ORGANIZED GROWTH
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46 CHAPTER 4. SELF-ORGANIZED GROWTH
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86 CHAPTER 6. P-MODULATION DOPING A
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100 CHAPTER 6. P-MODULATION DOPING
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Chapter 7 Transient-Enhanced Si Dif
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7.3. EXPERIMENTAL RESULTS 117 > 100
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7.3. EXPERIMENTAL RESULTS 119 Figur
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7.4. DETAILED CHARACTERIZATION AND
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7.4. DETAILED CHARACTERIZATION AND
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Chapter 8 Germanium Source Reconstr
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Figure 8.2: Elevated front-view of
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water lines. Figure 8.4: Photograph
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Figure 8.7: Part 2 of final constru
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Appendix A Calibration and Characte
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A.1. CALIBRATIONS 135 Figure A.1: X
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A.1. CALIBRATIONS 137 Figure A.3: N
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A.2. PHOTOLUMINESCENCE 139 Sample 1
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A.2. PHOTOLUMINESCENCE 141 Figure A
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A.2. PHOTOLUMINESCENCE 143 Figure A
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Appendix B General Physical Data B.
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Bibliography [1] Herbert Lichtenber
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BIBLIOGRAPHY 149 [42] M. B. Prince,
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BIBLIOGRAPHY 151 [85] J. Zhu, K. Br
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BIBLIOGRAPHY 153 [130] C. S. Peng,
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BIBLIOGRAPHY 155 [174] G. Medeiros-
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BIBLIOGRAPHY 157 [214] G. Bastard,
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Postface Curriculum Vitae ⋄ ∗ 1
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POSTFACE 161 � D. Gruber, D. Pach
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POSTFACE 163 Abbreviations AFM Atom
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