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Model-Driven Evolution of Software Architectures - Software and ...

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134 Chapter7. <strong>Model</strong>-<strong>Driven</strong>Migration<br />

x<br />

@Measure<br />

Figure 7.2:Simplifiedlayout<strong>of</strong>awaferscanner<br />

7.3.2 RunningExample:AWaferScanner<br />

@Expose<br />

InthischapterweconsidertheASMLwaferscannerasarepresentative<br />

example<strong>of</strong>anadvancedmanufacturingmachine.Waferscannersareused<br />

inthesemiconductorindustry<strong>and</strong>performthemostcriticalstepinthe<br />

manufacturingprocess<strong>of</strong>integratedcircuits(ICs).Figure7.2illustratesa<br />

scanner<strong>and</strong>itssubsystems.<br />

Aneighbouringmachine,thetrack(TR),performspre-processingsteps<br />

<strong>and</strong>deliverssiliconwaferstothepre-alignmentsystem(PA),wherethe<br />

waferorientation<strong>and</strong>alignmentaredetermined<strong>and</strong>adjusted. Next,the<br />

loadrobot(LR)transportsthewafertoone<strong>of</strong>thetwowaferstages(WS:0<br />

or WS:1). Here,thewafercharacteristicsaremeasured. Aftermeasurement,thewaferstagesareswapped<strong>and</strong>themeasuredwaferisexposed.<br />

Duringexposure,alaserprojectsanimage<strong>of</strong>therequiredICpatternonto<br />

thewafer’ssurfacethroughademagnificationlens.Awaferisexposedina<br />

scanningfashion,similartotheprocessusedinaphoto-copier.Eventually,<br />

thewafercomestoholdhundreds<strong>of</strong>smallcopies(i.e.,dies)<strong>of</strong>thispattern.<br />

Afterexposure,thestagesswapback<strong>and</strong>theunloadrobot(UR)transportstheexposedwafertothedischargeunit(DU)whereitisbuffered.Next,thewaferispickedupbythetrackagaintoundergovariouspostprocessingsteps.<br />

Now,thewaferisreadyforanotherexposureifneeded;<br />

theprocessisre-entrant.Witheachpassing,anotherlayerisaddedtoeach<br />

die.Oncethewaferhasbeenfullyprocessed<strong>and</strong>inspected,itisdicedinto<br />

individualdiesthatarepackagedt<strong>of</strong>ormICssuchasmicroprocessors.<br />

FortheSMCcomponent<strong>of</strong>thewaferscannerdepictedinFigure7.2,we<br />

canidentifythe‘processwaferw’manufacturingrequest,whichsupports<br />

concurrentmeasuring<strong>and</strong>exposing<strong>of</strong>twowafers.Toperformthisrequest<br />

manufacturingactivitiessuchas‘loadwaferwontowaferstageWS:0’<strong>and</strong><br />

‘unloadwaferwfromwaferstageWS:1’areexecuted.Forinstance,aftera

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