EpiTT / EpiCurve®TT LED-based for CCS reactor - Laytec

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EpiTT 488 EpiTT 488nm • optimized for AlInGaP and AlGaN applications • shorter wavelength is good for - thin layers (faster oscillation) - morphology measurements - composition sensitivity 2 June 2008 Recent product improvements 18
Reflectance EpiTT 488 0.6 0.5 0.4 0.3 0.2 0.1 • damping • high sensitivity for thin layers 0.0 100 200 300 400 500 600 700 800 900 time / s Example: AlGaN/AlN/Si, T=1060°C (calculated) n 3,0 < � g roughness measurement 2,5 Reflectance 0.6 0.5 0.4 0.3 0.2 0.1 20% Al • small damping • no damping 0.0 100 200 300 400 500 600 700 800 900 time / s > ~ � g composition sensitivity 10% Al AlGaN T wafer = 1060°C >> � g best for growth rate 20% Al 10% Al 2,0 200 300 400 Eg 500 600 700 wavelength (nm) 800 900 0,0 1000 wavelength (nm) 0.0 100 200 300 400 500 600 700 800 900 2 June 2008 Recent product improvements 19 Reflectance 0.6 0.5 0.4 0.3 0.2 0.1 1,0 0,9 0,8 0,7 0,6 0,5 0,4 0,3 0,2 0,1 k time / s
Page 1 and 2: Recent product improvements Dr. Kol
Page 3 and 4: EpiTT - experimental set-up EpiTT c
Page 5 and 6: EpiTT EpiTT - status until last mon
Page 7 and 8: Principle of pyrometry How does Pyr
Page 9 and 10: EpiTT EpiTT - status until last mon
Page 11 and 12: EpTT on 6x2“ CCS reactor GaN / Sa
Page 13 and 14: EpTT on 6x2“ CCS reactor EpiTT- L
Page 15 and 16: EpTT on 6x2“ CCS reactor GaN / Sa
Page 17: Outline Recent product improvements
Page 21 and 22: EpiTT 488 Example: AlInGaP optimum
Page 23 and 24: EpiTT 488 UV-LED structure: simulat
Page 25 and 26: EpiTT / EpiCurve ® in HVPE Challen
Page 27 and 28: EpiTT / EpiCurve ® in HVPE High ti
Page 29 and 30: EpiCurve ® TT in HVPE Special EpiC
Page 31 and 32: EpiTT / EpiCurve ® in HVPE Challen
Page 33 and 34: EpiCurve ® TT EpiCurve ® TT stand
Page 35 and 36: New EpiCurve ® option Curve only s
Page 37 and 38: Outline Summary • EpiTT in CCS re

EpiTT / EpiCurve®TT LED-based for CCS reactor - Laytec

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