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The Importance of Nanotechnology and Nanometrology for Space ...

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TAS-ail.eps<br />

Achromatic Interference Lithography<br />

resist-coated<br />

substrate<br />

λ=193 nm<br />

100 nm-period<br />

interference pattern<br />

micrometer<br />

phase grating<br />

(p = 200 nm)<br />

λ=193 nm (ArF excimer) can pattern 100 nm period (10,000 lines/mm)<br />

λ=157 nm (F 2 excimer) can pattern 80 nm period (12,000 lines/mm)

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