28.02.2014 Views

As and Epitaxial-Growth MnSi Thin Films - OPUS Würzburg

As and Epitaxial-Growth MnSi Thin Films - OPUS Würzburg

As and Epitaxial-Growth MnSi Thin Films - OPUS Würzburg

SHOW MORE
SHOW LESS

You also want an ePaper? Increase the reach of your titles

YUMPU automatically turns print PDFs into web optimized ePapers that Google loves.

120 A. Fabrication of Four-Terminal Corbino Gated Structure<br />

Fig. A.2: Bridge structures used for the Corbino sturctures. Because of the length of bridges<br />

used, bridges with supporting posts (a) made of cross-linked PMMA (insulating) was used.<br />

However for some structures, bridges (Figure A.2.b.) are stable enough without needing the<br />

extra posts.<br />

A.1 Fabrication Details<br />

The Corbino structure <strong>and</strong> four-terminal configuration was used for canceling spurious<br />

effects coming from contact resistance. Because of the latter, the conductance fluctuations<br />

can be attributed to scattering <strong>and</strong> localization processes within the material. The<br />

disadvantage of this structure is that the Hall effect is shorted <strong>and</strong> cannot be measured<br />

in this geometry. The design of the main four-terminal device is shown in Figure A.1<br />

The device is composed of four rings, where the current is applied in rings R1 <strong>and</strong> R4<br />

withthevoltagedropmeasured alongringsR2<strong>and</strong>R3, followingthenormal four-terminal<br />

measurement configuration. These rings are 1µm in width, which necessitate the need of<br />

a suspended metallic connection from the rings to bigger bond pads while avoiding the<br />

conducting substrate. The bridge step refers to the technique by [Borz 05]. The crosslinked<br />

PMMA step was included to ensure that the structures (long bridges) do not short<br />

to the conducting substrate, but has been proven unnecessary because of the stability of<br />

the bridge structures.<br />

The gradient of dose factors are to correct for the proximity effect. Lower dose causes<br />

left-over resist to form clumps under the contacts <strong>and</strong> increase contact resistances. (Figure<br />

A.1) Another effect of incorrect dose calibration is difficulties in lifting off the metal<br />

in between rings without using an ultra-sonic bath. Because of the closed smooth (no<br />

corners) structure, lifting off metal from this structure is very challenging. A good calibration<br />

of the e-beam dosage would result in a resist profile where the metal can easily

Hooray! Your file is uploaded and ready to be published.

Saved successfully!

Ooh no, something went wrong!