130 [Brin 70] W. Brinkman, R. Dynes, <strong>and</strong> J. Rowell. Journal of applied physics, Vol. 41, No. 5, pp. 1915–1921, 1970. [Bute 10] A. B. Butenko, A. A. Leonov, U. K. Rler, <strong>and</strong> A. N. Bogdanov. Phys. Rev. B, Vol. 82, No. 5, pp. 052403–, 2010. [Camp 82] I. Campbell <strong>and</strong> A. Fert. Vol. 3North-Holl<strong>and</strong>, Amsterdam, p. 747, 1982. [Cane 00] C.Canedy, H.Li, S.Alpay, L.Salamanca-Riba, A. Roytburd, <strong>and</strong>R.Ramesh. Applied Physics Letters, Vol. 77, p. 1695, 2000. [Cham 01] S. Chambers, Y. Liang, Z. Yu, R. Droopad, <strong>and</strong> J. Ramdani. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, <strong>and</strong> <strong>Films</strong>, Vol. 19, No. 3, pp. 934–939, 2001. [Chib 03] D. Chiba, M. Yamanouchi, F. Matsukura, <strong>and</strong> H. Ohno. Science, Vol. 301, No. 5635, pp. 943–945, 2003. [Chib 04] D. Chiba, Y. Sato, T. Kita, F. Matsukura, <strong>and</strong> H. Ohno. Phys. Rev. Lett., Vol. 93, No. 21, pp. 216602–, 2004. [Chib 06a] D. Chiba. Applied Physics Letters, Vol. 89, No. 16, pp. 162505–, 2006. [Chib 06b] D. Chiba, M. Yamanouchi, F. Matsukura, T. Dietl, <strong>and</strong> H. Ohno. Phys. Rev. Lett., Vol. 96, No. 9, pp. 096602–, 2006. [Chib 08] D.Chiba, M.Sawicki, Y.Nishitani, Y.Nakatani, F.Matsukura, <strong>and</strong>H.Ohno. Nature, Vol. 455, No. 7212, pp. 515–518, 2008. [Diet 00] T.Dietl, H.Ohno, F.Matsukura, J.Cibert, <strong>and</strong>D.Ferr<strong>and</strong>. Science,Vol.287, No. 5455, pp. 1019–1022, 2000. [Diet 01a] T. Dietl. Journal of Applied Physics, Vol. 89, No. 11, pp. 7437–, 2001. [Diet 01b] T. Dietl, H. Ohno, <strong>and</strong> F. Matsukura. Phys. Rev. B, Vol. 63, No. 19, pp. 195205–, 2001. [Diet 08] T. Dietl. Journal of Applied Physics, Vol. 103, No. 7, pp. 07D111–, 2008. [Diet 13] T. Dietl <strong>and</strong> H. Ohno. arXiv preprint arXiv:1307.3429, 2013. [Duan 08] C.-G. Duan, J. P. Velev, R. F. Sabirianov, W.-N. Mei, S. S. Jaswal, <strong>and</strong> E. Y. Tsymbal. Applied Physics Letters, Vol. 92, No. 12, pp. 122905–122905, 2008. [Dzya 58] I. Dzyaloshinsky. Journal of Physics <strong>and</strong> Chemistry of Solids, Vol. 4, No. 4, pp. 241–255, 1958. [Dzya 64] I. Dzyaloshinskii. Sov. Phys. JETP, Vol. 19, pp. 960–971, 1964. [Edmo 02] K. Edmonds. Applied Physics Letters, Vol. 81, No. 26, pp. 4991–, 2002.
131 [Edmo 03] K. Edmonds. Journal of Applied Physics, Vol. 93, No. 10, pp. 6787–, 2003. [Edmo 04] K. W. Edmonds, P. Bogusawski, K. Y. Wang, R. P. Campion, S. N. Novikov, N. R. S. Farley, B. L. Gallagher, C. T. Foxon, M. Sawicki, T. Dietl, M. BuongiornoNardelli, <strong>and</strong>J.Bernholc. Phys. Rev. Lett., Vol.92, No.3, pp. 037201–, 2004. [Efro 75] A. Efros <strong>and</strong> B. Shklovskii. Journal of Physics C: Solid State Physics, Vol. 8, No. 4, p. L49, 1975. [Eise 00] [Eise 02] K. Eisenbeiser, J. Finder, Z. Yu, J. Ramdani, J. Curless, J. Hallmark, R. Droopad, W. Ooms, L. Salem, S. Bradshaw, et al. Applied Physics Letters, Vol. 76, No. 10, pp. 1324–1326, 2000. K. Eisenbeiser, R. Emrick, R. Droopad, Z. Yu, J. Finder, S. Rockwell, J. Holmes, C. Overgaard, <strong>and</strong> W. Ooms. Electron Device Letters, IEEE, Vol. 23, No. 6, pp. 300–302, 2002. [Enge 12] J. Engelke, T. Reimann, L. Hoffmann, S. Gass, D. Menzel, <strong>and</strong> S. Süllow. Journal of the Physical Society of Japan, Vol. 81, No. 12, p. 124709, 2012. [Fert 13] A. Fert, V. Cros, <strong>and</strong> J. Sampaio. Nat Nano, Vol. 8, No. 3, pp. 152–156, 2013. [Frie 06] [Fth 99] K.-J. Friedl<strong>and</strong>, M. Bowen, J. Herfort, H. P. Schnherr, <strong>and</strong> K. H. Ploog. Journal of Physics: Condensed Matter, Vol. 18, No. 9, pp. 2641–, 2006. M. Fth, S. Freisem, A. A. Menovsky, Y. Tomioka, J. Aarts, <strong>and</strong>J. A. Mydosh. Science, Vol. 285, No. 5433, pp. 1540–1542, 1999. [Gare 10] R. Gareev, A. Petukhov, M. Schlapps, J. Sadowski, <strong>and</strong> W. Wegscheider. Applied Physics Letters, Vol. 96, No. 5, pp. 052114–052114, 2010. [Gerb 02] A. Gerber, A. Milner, L. Goldshmit, M. Karpovski, B. Lemke, H.-U. Habermeier, <strong>and</strong> A. Sulpice. Physical Review B, Vol. 65, No. 5, p. 054426, 2002. [Gira 07] R. Giraud, L. Vila, A. Lemaitre, <strong>and</strong> G. Faini. Applied Surface Science, Vol. 254, No. 1, pp. 343–346, 2007. [Golo 13] T. Golod, A. Rydh, P. Svedlindh, <strong>and</strong> V. M. Krasnov. Phys. Rev. B, Vol. 87, No. 10, pp. 104407–, 2013. [Goul 02] C. Gould, G. Schmidt, G. Richter, R. Fiederling, P. Grabs, <strong>and</strong> L. Molenkamp. Applied Surface Science, Vol. 190, No. 1-4, pp. 395–402, 2002. [Goul 04] C. Gould, C. Rster, T. Jungwirth, E. Girgis, G. M. Schott, R. Giraud, K. Brunner, G. Schmidt, <strong>and</strong> L. W. Molenkamp. Phys. Rev. Lett., Vol. 93, No. 11, pp. 117203–, 2004.
- Page 1 and 2:
Characterization of Novel Magnetic
- Page 3 and 4:
Contents Zusammenfassung 4 Summary
- Page 5 and 6:
Zusammenfassung Um einerseits ein f
- Page 7 and 8:
Zusammenfassung 3 auf die anomale t
- Page 9 and 10:
Summary The study of magnetic phase
- Page 11 and 12:
Summary 7 bandstructure affecting t
- Page 13 and 14:
Chapter 1 Introduction Spin electro
- Page 15 and 16:
11 states in the MnSi. Chapter 9 fi
- Page 17 and 18:
Chapter 2 Diluted Ferromagnetic Sem
- Page 19 and 20:
2.1. Basic properties of (Ga,Mn)As
- Page 21 and 22:
2.3. Electrical Control of Magnetiz
- Page 23 and 24:
2.4. (Ga, Mn)As and the Metal-Insul
- Page 25 and 26:
2.4. (Ga, Mn)As and the Metal-Insul
- Page 27 and 28:
2.5. Summary 23 2.5 Summary A brief
- Page 29 and 30:
Chapter 3 Electric Control of Magne
- Page 31 and 32:
3.2. Electrical control of magnetiz
- Page 33 and 34:
3.2. Electrical control of magnetiz
- Page 35 and 36:
3.2. Electrical control of magnetiz
- Page 37 and 38:
3.2. Electrical control of magnetiz
- Page 39 and 40:
3.2. Electrical control of magnetiz
- Page 41 and 42:
3.2. Electrical control of magnetiz
- Page 43 and 44:
3.2. Electrical control of magnetiz
- Page 45 and 46:
3.3. Reproducible Conductance Fluct
- Page 47 and 48:
3.4. Summary 43 changed significant
- Page 49 and 50:
Chapter 4 Epitaxial lift-off of (Ga
- Page 51 and 52:
4.2. Test Barrier Material 47 Fig.
- Page 53 and 54:
4.4. Magnetotransport in ELO-proces
- Page 55 and 56:
4.4. Magnetotransport in ELO-proces
- Page 57 and 58:
4.5. Electrical gating of ELO-proce
- Page 59 and 60:
Chapter 5 Basic properties of Ferro
- Page 61 and 62:
5.1. Bulk properties of MnSi 57 (a)
- Page 63 and 64:
5.2. Expitaxially-grown MnSi Thin F
- Page 65 and 66:
5.2. Expitaxially-grown MnSi Thin F
- Page 67 and 68:
5.3. Skyrmions, Chirality and Magne
- Page 69 and 70:
5.3. Skyrmions, Chirality and Magne
- Page 71 and 72:
5.4. Summary 67 tions. MnSi provide
- Page 73 and 74:
Chapter 6 Epitaxial Growth of MnSi
- Page 75 and 76:
6.2. Material Characterization 71 F
- Page 77 and 78:
6.2. Material Characterization 73 M
- Page 79 and 80:
6.3. Device Fabrication 75 Fig. 6.5
- Page 81 and 82:
6.4. Temperature-dependent measurem
- Page 83 and 84: 6.5. Summary 79 expected for the he
- Page 85 and 86: Chapter 7 Magnetotransport with H
- Page 87 and 88: 7.1. Hall Measurements 83 0 J || [-
- Page 89 and 90: 7.1. Hall Measurements 85 0.40 R xy
- Page 91 and 92: 7.1. Hall Measurements 87 is two or
- Page 93 and 94: 7.1. Hall Measurements 89 6 J || [1
- Page 95 and 96: 7.1. Hall Measurements 91 0.02 0.00
- Page 97 and 98: 7.1. Hall Measurements 93 0.100 -55
- Page 99 and 100: 7.1. Hall Measurements 95 0.15 R xy
- Page 101 and 102: 7.1. Hall Measurements 97 Magnetore
- Page 103 and 104: 7.2. Summary 99 T c . The sign of t
- Page 105 and 106: Chapter 8 Magnetotransport with In-
- Page 107 and 108: 8.1. Magnetotransport Measurements
- Page 109 and 110: 8.1. Magnetotransport Measurements
- Page 111 and 112: 8.1. Magnetotransport Measurements
- Page 113 and 114: 8.1. Magnetotransport Measurements
- Page 115 and 116: 8.1. Magnetotransport Measurements
- Page 117 and 118: 8.1. Magnetotransport Measurements
- Page 119 and 120: 8.2. Summary 115 8.2 Summary Low ma
- Page 121 and 122: Chapter 9 Conclusions & Outlook In
- Page 123 and 124: Appendix A Fabrication of Four-Term
- Page 125 and 126: A.2. Optimized final process 121 Fi
- Page 127 and 128: A.2. Optimized final process 123 95
- Page 129 and 130: Appendix B Epitaxial lift-off techn
- Page 131 and 132: 127 Evap 2 Wire Rinse in water 1min
- Page 133: Bibliography [Abra 96] E. Abrahams
- Page 137 and 138: 133 [Ishi 77] Y. Ishikawa, G. Shira
- Page 139 and 140: 135 [Mudu 05] P. K. Muduli, K.-J. F
- Page 141 and 142: 137 [Rich 10] A. Richardella, P. Ro
- Page 143 and 144: 139 [Vila 07] L. Vila, R. Giraud, L
- Page 145: Acknowledgements First ofall I woul