Online Semi-radius Probe Tip Cleaning and Reshaping

More documents

Recommendations

Info

Agenda Acknowledgements Background info Setup <strong>and</strong> measurement technique Contact resistance results <strong>Cleaning</strong> recipe parameters to consider Silicone vs polymer based materials Summary Future work June 3, 2007 IEEE SW Test Workshop 2
Acknowledgements Jack Courtney John Cartier Steve Duda Les Griffith Rob Holwager Glen Langsman Josh Pendergast June 3, 2007 IEEE SW Test Workshop 3
Page 1: Online Semi-radius Probe Tip Cleani
Page 5 and 6: Why Semi-radius? Lower pad damage i
Page 7 and 8: The problem with Semi- radiused pro
Page 9 and 10: The solution Two part cleaning - in
Page 11 and 12: June 3, 2007 Typical recipes 5 -10
Page 13 and 14: Contact resistance - Elastomeric 5
Page 15 and 16: Contact resistance - dual clean JEM
Page 17 and 18: Measurement circuit • Test stimul
Page 19 and 20: SiC clean Typical flat tip Silicon
Page 21 and 22: Sequence and motion (use animation)
Page 23 and 24: Detractor Die Size limited - effect
Page 25: 142 mm 155 mm Future work Evaluate

Online Semi-radius Probe Tip Cleaning and Reshaping

You also want an ePaper? Increase the reach of your titles

Delete template?

Save as template?