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FINFET Isolation Approaches and Ramifications - SOI Industry ...

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IBM Semiconductor Research <strong>and</strong> Development Center<br />

The Main Event – why <strong>SOI</strong> FinFETs are better<br />

• Fully Depleted Transistors: FD<strong>SOI</strong> <strong>and</strong> FinFETs<br />

– Similarities<br />

Electrostatics<br />

Access resistance<br />

Threshold fluctuations<br />

– Differences<br />

Physical Orientation<br />

Density <strong>and</strong> “fin effect”<br />

Backgate <strong>and</strong> body effect<br />

• FinFETs on <strong>SOI</strong> <strong>and</strong> bulk substrates<br />

– Process Comparison<br />

– Fin Taper<br />

– <strong>Isolation</strong> doping<br />

Intrawell/Interwell<br />

Drain-source<br />

– Self-heating <strong>and</strong> history effect<br />

– Transistor mismatch<br />

– Work function <strong>and</strong> gate reliability<br />

– Process variations<br />

• Conclusion<br />

FD<strong>SOI</strong> Workshop Hsinchu, Taiwan April 22, 2013

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