04.01.2015 Views

FINFET Isolation Approaches and Ramifications - SOI Industry ...

FINFET Isolation Approaches and Ramifications - SOI Industry ...

FINFET Isolation Approaches and Ramifications - SOI Industry ...

SHOW MORE
SHOW LESS

Create successful ePaper yourself

Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.

IBM Semiconductor Research <strong>and</strong> Development Center<br />

The 3D Effect in FinFET<br />

FD<strong>SOI</strong><br />

Effective width ~1X (current <strong>and</strong> capacitance)<br />

Aerial width ~0.7X<br />

FinFET<br />

• FD<strong>SOI</strong> is conventionally planar<br />

– The current drive <strong>and</strong> device<br />

capacitance <strong>and</strong> the layout footprint<br />

correspond directly<br />

Footprint width<br />

Electrical width<br />

• FinFET is 3-D<br />

– has more current drive (<strong>and</strong> also<br />

capacitance) per layout footprint<br />

Where the<br />

gate will be<br />

fin<br />

FD<strong>SOI</strong> Workshop Hsinchu, Taiwan April 22, 2013

Hooray! Your file is uploaded and ready to be published.

Saved successfully!

Ooh no, something went wrong!