FINFET Isolation Approaches and Ramifications - SOI Industry ...
FINFET Isolation Approaches and Ramifications - SOI Industry ...
FINFET Isolation Approaches and Ramifications - SOI Industry ...
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IBM Semiconductor Research <strong>and</strong> Development Center<br />
Fin Taper: detrimental to device performance<br />
• Electrostatics <strong>and</strong><br />
current density vary<br />
through fin height<br />
• Massive doping<br />
suppresses some<br />
contribution of fat-fin<br />
region but current<br />
degraded<br />
• Output conductance<br />
for <strong>SOI</strong> with vertical fin<br />
empirically<br />
demonstrated to be<br />
superior to bulk with<br />
tapered fin<br />
FD<strong>SOI</strong> Workshop Hsinchu, Taiwan April 22, 2013
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