from first principles PP-I-1

PP-III-119Atomic Layer Deposition for Water Gas Shift Reaction over BimetallicCatalystsZemlyanov D.Y.1 Purdue University, Birck Nanotechnology Center, West Lafayette, IN 47907-2057, USAdzemlian@purdue.eduAtomic layer deposition (ALD) uses self-limiting chemical reactions between gaseousprecursors and a solid surface to deposit materials in a layer-by-layer manner. For thecatalytic applications, this process results in a unique combination of attributes, including subnmprecision, the capability to engineer surfaces and interfaces, and unparalleledconformability over high-aspect ratio and nanoporous structures. Keeping in mind thesecapabilities, ALD could have a certain impact in the design of catalytic materials with thedesired properties. The presentation will survey the recent work applying ALD toheterogeneous catalysts for water gas shift reaction in particularly. We will considersupported catalysts as well as model catalysts prepared on a flat support.280