Production of Polysilicon using a Modified Siemens Process
Production of Polysilicon using a Modified Siemens Process
Production of Polysilicon using a Modified Siemens Process
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4. High boiling impurities exit at the bottom <strong>of</strong> the column<br />
Post-condition: The desired compound is isolated at a certain purity level and passed<br />
onto the next step in the reaction<br />
Scenario (1.2.1): Separation <strong>of</strong> H2<br />
<br />
Description: H2 is removed from the FBR products<br />
Primary Object: Flash Distillation Drum<br />
Primary Actors: H2, TCS,TET, BCl3, P2Cl5<br />
Pre-condition: Inputs are fed in at proper conditions and the distillation drum is<br />
maintained at proper conditions<br />
Flow <strong>of</strong> Events:<br />
1. FBR products are fed into drum<br />
2. Products cooled until only H2 remains as gas<br />
3. H2 exits and other compounds are isolated<br />
Post-condition: All H2 is removed from the FBR product stream. The H2-free<br />
stream continues through the rest <strong>of</strong> the process. The removed H2 is<br />
recycled for use later in the process.<br />
Scenario (1.2.2): Separation <strong>of</strong> BCl3<br />
Description: BCl3 is removed from the H2 separation products<br />
Primary Object: Distillation Column<br />
Primary Actors: TCS,TET, BCl3, P2Cl5<br />
Pre-condition: Inputs are fed in at proper conditions and the<br />
distillation column is maintained at proper conditions<br />
Flow <strong>of</strong> Events:<br />
4. H2 separation products are fed into column<br />
5. H2 separation column products undergo reflux<br />
6. BCl3 boils most easily and exits at the top <strong>of</strong> the column, with a small<br />
amount <strong>of</strong> other compounds<br />
7. Other compounds exit at the bottom <strong>of</strong> the column