Production of Polysilicon using a Modified Siemens Process
Production of Polysilicon using a Modified Siemens Process
Production of Polysilicon using a Modified Siemens Process
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Scenario (1.4.1): Separation <strong>of</strong> TET<br />
<br />
Description: TET is removed from the CVD products<br />
Primary Object: Distillation Column<br />
Primary Actors: TCS,TET, HCl, DCS<br />
Pre-condition: Inputs are fed in at proper conditions and distillation column is<br />
maintained at proper conditions<br />
Flow <strong>of</strong> Events:<br />
1. CVD products are fed into column<br />
2. CVD products undergo reflux<br />
3. TET boils least readily and is separated from TCS and exits at the<br />
bottom <strong>of</strong> the column<br />
4. TCS, HCl, and DCS exits at the top <strong>of</strong> the column<br />
Post-condition: Most TET is removed from stream at the top <strong>of</strong> the<br />
column. Both streams go on to be processed further<br />
Scenario (1.4.2): Separation <strong>of</strong> HCl<br />
Description: HCl is removed from the CVD products for recycle<br />
Primary Object: Distillation Column<br />
Primary Actors: TCS, HCl, DCS<br />
Pre-condition: Inputs are fed in at proper conditions and distillation column is<br />
maintained at proper conditions<br />
Flow <strong>of</strong> Events:<br />
1. TET Separation products are fed into column<br />
2. TET Separation products undergo reflux<br />
3. HCl boils most easily and exits at the top <strong>of</strong> the column<br />
4. TCS, DCS exit at bottom<br />
Post-condition: Most HCl is removed from stream at the bottom <strong>of</strong> the<br />
column. Both streams are recycled back into the process<br />
Scenario (1.5): Formation <strong>of</strong> SiO2