Production of Polysilicon using a Modified Siemens Process
Production of Polysilicon using a Modified Siemens Process
Production of Polysilicon using a Modified Siemens Process
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Use Case Scenario Req.<br />
#<br />
<br />
1.2.4 1.2.5 Most TET is separated from TCS<br />
1.3 1.3.1 TCS reacts with H2 to form Poly-Si<br />
1.3 1.3.2 Poly-si is deposited onto seed rods<br />
1.3 1.3.3 Poly-si is >99.9999% purity<br />
1.3 1.3.4 Other compounds exit CVD safetly<br />
1.4 1.4.1<br />
1.4.1 1.4.2<br />
Products from CVD are separated into<br />
desirables and undesirables<br />
Most TET is removed from CVD<br />
product stream<br />
1.4.2 1.4.3 Most HCl is removed from stream<br />
1.5 1.5.1<br />
TET must react with H2O to form<br />
SiO2<br />
1.5 1.5.2 SiO2 must be >97% purity<br />
1.5 1.5.3<br />
1.5.1 1.5.4<br />
1.5.1 1.5.5<br />
Description<br />
Most TET from process must be<br />
consumed<br />
SiO2 must exit through bottom <strong>of</strong><br />
cyclone<br />
Other compounds exit through top <strong>of</strong><br />
cyclone