Annex I - VERTIC

▼M2
3D Software
3D001 ‘Software’ specially designed for the ‘development’ or ‘production’
of equipment specified in 3A001.b. to 3A002.g. or 3B.
3D002 ‘Software’ specially designed for the ‘use’ of equipment specified
in 3B001.a. to f. or 3B002.
3D003 ‘Physics-based’ simulation ‘software’ specially designed for the
‘development’ of lithographic, etching or deposition processes
for translating masking patterns into specific topographical
patterns in conductors, dielectrics or semiconductor materials.
Technical Note:
‘Physics-based’ in 3D003 means using computations to determine
a sequence of physical cause and effect events based on physical
properties (e.g. temperature, pressure, diffusion constants and
semiconductor materials properties).
Note: Libraries, design attributes or associated data for the
design of semiconductor devices or integrated circuits are
considered as ‘technology’.
3D004 ‘Software’ specially designed for the ‘development’ of the
equipment specified in 3A003.
3D101 ‘Software’ specially designed or modified for the ‘use’ of
equipment specified in 3A101.b.
2009R0428 — EN — 15.06.2012 — 002.001 — 174