Q150T S/E/ES Sample Preparation System Instruction Manual

Name Default
Value
Evaporation
Current (A)
Evaporation time
(Minutes)
Max Evaporation
Voltage(V)
Q150T Sample Preparation System
Table 26 Aperture Cleaning profile parameters
Minimum
Value
Maximum
Value
Comment
0 0 50** Current applied to evaporation
source during the evaporation.
**If Max Evaporation Voltage
parameter set below 2V the
maximum value will increase to
100A.
1 0.1 4 Duration of evaporation pulse.
20 1 20 Set the maximum voltage that
can be driven on to the source.
Tooling Factor 5 0.1 10 Tooling factor for this process
Pump hold No No Yes If Yes, Q150T pumps down to
outgas-ready state and waits for
user input.
Note: If hold time (set in
System | Vacuum | Pump hold
time – see page 41) is
exceeded, Q150T vents
chamber.
Flush chamber No No Yes Set to Yes to flush chamber
with nitrogen before pumping
down.
Name Default
Value
Shut down
Vacuum (mBar)
Table 27 Vacuum shutdown properties
Minimum
Value
9.2 System Overrideable Parameters
Maximum
Value
Comment
1 1x10-2 1x10+2 Set the Vacuum that the system
will pump down to.
Note the final vacuum may be
different.
If you have Admin group privileges, you can override some of the parameters normally
determined by the selected profile.
Table 28 System override properties
Name Overridden System property Description
Gas bleed time System>Generic Sputter> Gas bleed
time
Bleed Vacuum System>Generic Sputter> Bleed
Vacuum
Clean current System>Generic Sputter> Clean
current
Time Ar allowed to flow into
chamber before plasma started
Pressure at which the chamber
is maintained at while the
plasma is present
Current at which the target is
cleaned at.
Clean time System>Generic Sputter> Clean time Time for which the target is
cleaned for
Stage rotate System>Hardware>Stage Rotate Allow the stage to be turned off
for just this cycle
Stage Speed System>Hardware>Stage Speed Set the speed of the stage for
this process
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